Samsung Electronics Co., Ltd.

Sang-oh Park

Pil-Kwon Jun

Sang-mun Chon

Kyung-dae Kim

Dong-jin Park

Jin-ho Hwang

Il-hyun Sohn

Hun-Jung Yi

Bo-yong Lee

Ki-seok Lee

A resist removing composition having a superior capability for removing a resist, polymer, organometallic polymer and etching by-products such as metal oxide, which does not attack underlying layers exposed to the composition and which does not leave residues after a rinsing step. The resist removing composition contains alkoxy N-hydroxyalkyl alkanamide and a swelling agent.

Resist and etching by-product removing composition and resist removing method using the same

A drying system for drying a semiconductor substrate is provided. The drying system includes: a chamber for housing a vapor distributor and a fluid bath, said fluid bath being disposed in a lower portion of the chamber and said distributor being disposed in an upper portion of the chamber for distributing vapor for drying the substrate; and a fluid flow system for supplying fluid flow into said fluid bath for cleaning and drying the substrate and for draining said fluid from the fluid bath, wherein the chamber includes a plurality of exhaust vents disposed at the upper portion for venting the vapor.

System and method for drying semiconductor substrate

Growing community of inventors

Sungnam, South Korea

Sang-oh Park