Skhynix Inc.

Sang Hyun Sung

Sung Lae Oh

Yong Kim

Jin Ho Kim

Young Ki Kim

Hyun Soo Shin

Kwang Hwi Park

Chang Woon Choi

Chang Man Son

Byung Hyun Jeon

Jeong Hwan Kim

Soo Nam Jung

Tae Sung Park

Sang Woo Park

Byung Hyun Jun

Je Hyun Choi

Kang Sik Choi

Dong Hyuk Kim

Dae Hun Kwak

Chang Woo Kang

A three-dimensional memory device includes a first electrode structure and a second electrode structure extending in a first direction, being adjacent to each other in a second direction intersecting with the first direction, and each including a plurality of electrode layers and a plurality of interlayer dielectric layers which are alternately stacked on a source plate; a plurality of first slimming holes formed in the first electrode structure to expose pad regions of the electrode layers of the first electrode structure, and arranged in the first direction; and a plurality of second slimming holes formed in the second electrode structure to expose pad regions of the electrode layers of the second electrode structure, and arranged in the first direction, wherein a first slimming hole and a second slimming hole which are adjacent in the second direction have different depths.

Three-dimensional memory device

A three-dimensional semiconductor device includes a peripheral circuit device layer that includes a page buffer area, a pass transistor area adjacent to the page buffer layer, and a logic transistor area adjacent to the pass transistor area in the first direction, and a memory cell device layer that includes a cell area and a staircase area extending from the cell area. The peripheral circuit device layer includes transistors, peripheral circuit via plugs, and peripheral circuit interconnection layers on a substrate. The memory cell device layer includes word line stack including interlayer insulating layers and word lines alternately stacked, the word line stack including end portions stacked in a staircase in the staircase area; a bit line array including bit lines arranged in the cell area; and word line pillars electrically connected to the end portions of the word lines in the staircase area, respectively.

Three-dimensional semiconductor device

A semiconductor memory device includes a first semiconductor layer including a memory cell array; a second semiconductor layer including a first substrate and a page buffer circuit which is configured on the first substrate; a third semiconductor layer disposed between the first semiconductor layer and the second semiconductor layer in a vertical direction, and including a second substrate and a second logic circuit which is configured on an element region of the second substrate; and a first contact plug passing through a coupling region of the second substrate which overlaps the page buffer circuit in the vertical direction.

Semiconductor memory device including stacked semiconductor layers

A memory device includes a first semiconductor structure including pass transistors defined in a row decoder region of a substrate, a first bonding layer including first bonding pads, and bottom wiring layers disposed between the substrate and the first bonding layer; a second semiconductor structure including a second bonding layer including second bonding pads bonded to the first bonding pads, a memory cell array, and a top wiring layer disposed between the second bonding layer and the memory cell array; and global lines disposed in the row decoder region, and configured to transfer operating voltages to the pass transistors, wherein the bottom wiring layers include bottom wiring layers of a first tier and bottom wiring layers of a second tier disposed over the bottom wiring layers of the first tier, and the global lines are disposed in at least one of the bottom wiring layers of the first tier.

Memory device including row decoder

A memory device may include an electrode structure including a plurality of electrode layers and a plurality of interlayer dielectric layers that are alternately stacked on a substrate; a trench in the electrode structure, and having an upper sidewall, a lower sidewall and a horizontal portion that couples the upper sidewall to the lower sidewall and that is parallel to a top surface of the substrate; a dielectric layer in the trench; and a slimming hole in the electrode structure having a sidewall of the trench and a region of the dielectric layer, and having a bottom surface disposed on an electrode layer on which the horizontal portion of the trench is positioned.

Memory device and manufacturing method thereof

A semiconductor device includes a stack including a plurality of electrode layers and a plurality of interlayer dielectric layers that are alternately stacked in a vertical direction on a substrate; and a plurality of vertical pass transistors disposed over the stack, and each of the plurality of vertical pass transistors coupled to a corresponding electrode layer, wherein the plurality of vertical pass transistors includes a plurality of first vertical pass transistors and a plurality of second vertical pass transistors, and the plurality of second vertical pass transistors are disposed over the plurality of first vertical pass transistors to be staggered with the plurality of first vertical pass transistors.

Semiconductor device including pass transistors

A semiconductor memory device includes a memory structure including a plurality of memory cells which are disposed on a cell region of a source plate; a plurality of contact plugs passing through the source plate in a coupling region of the source plate including at least a portion of a center portion of the source plate, and separated from the source plate by a dielectric layer pattern; a discharge contact passing through the source plate in the coupling region, and coupled to the center portion of the source plate; and a discharge region coupled to the discharge contact. The discharge region is located in a substrate below the source plate.

Semiconductor memory device including a discharge contact

A three-dimensional memory device and a manufacturing method thereof. The three-dimensional memory device includes an electrode structure including a plurality of electrode layers and a plurality of interlayer dielectric layers which are alternately stacked on a substrate; and a plurality of through holes passing through the electrode structure in a vertical direction, and including pad regions at the transition between portions of the through holes have different widths.

Three-dimensional memory device and manufacturing method thereof

A substrate processing apparatus may include a vacuum chamber, a substrate supporting unit disposed at lower portion of an inside of the vacuum chamber, and an electric field forming unit forming an electric field inside the vacuum chamber. The electric field forming unit may include an upper electrode disposed at an upper portion of the inside of the vacuum chamber, a lower electrode disposed in the substrate supporting unit, and a middle electrode disposed between the upper electrode and the lower electrode.

Substrate processing apparatus having a middle electrode

A memory device includes a cell wafer including a memory cell array; and a peripheral wafer including a row control circuit, a column control circuit and a peripheral circuit which control the memory cell array, and stacked on and bonded to the cell wafer in a first direction. The peripheral wafer includes a first substrate having a first surface and a second surface which face away from each other in the first direction; a first logic structure disposed on the first surface of the first substrate, and including the row control circuit and the column control circuit; and a second logic structure disposed on the second surface of the first substrate, and including the peripheral circuit.

Memory device having vertical structure

A memory device includes a plurality of bit lines extending in a first direction and arranged in a second direction; and a cell region including a plane which is coupled to the plurality of bit lines, wherein the plane is divided into a plurality of memory groups each including a plurality of partial pages to be disposed in a plurality of rows in the first direction.

Memory device including partial pages in memory blocks

A unit page buffer block includes first to fourth page buffer pairs. Each of the page buffer pairs includes a common column decoder block; and an upper page buffer stage and a lower page buffer stage electrically and commonly connected to the common column decoder block. Each of the upper page buffer stages includes an upper selection block; an upper latch block; and an upper cache block. Each of the lower page buffer stage includes a lower selection block; a lower latch block; and a lower cache block. Each of the upper selection blocks includes first to fourth sub-selection blocks. Each of the upper and lower latch blocks includes first to twelfth upper sub-latch blocks. Each of the upper and lower cache blocks includes first to twelfth upper sub-cache blocks. Each of the common column decoder block includes first to third sub-common column decoder blocks arranged in a row direction.

Semiconductor memory device including unit page buffer blocks having four page buffer pairs

A semiconductor memory device includes a memory cell array disposed over a substrate extending in a first direction and a second direction intersecting with the first direction in a first semiconductor layer, and including a plurality of cell units and at least two via regions that are arranged in the second direction, wherein a width of each of the at least two via regions in the second direction is a multiple of a width of each of the plurality of cell units in the second direction.

Semiconductor memory device having cell units and via regions with a different width

A memory device includes a pass transistor circuit included in a first wafer, and configured to transfer an operating voltage to row lines of a memory cell array; and a discharge transistor circuit included in a second wafer that overlaps with the first wafer in a vertical direction, and configured to transfer a discharge voltage to at least one of the row lines.

Memory device including a pass transistor circuit and a discharge transistor circuit

A memory device includes a substrate defined with a first cell region and a second cell region, and a row decoder region between the first and second cell regions; a peripheral circuit defined in the first and second cell regions of the substrate; pass transistors defined in the row decoder region of the substrate; bottom wiring layers disposed in a first dielectric layer covering the peripheral circuit and the pass transistors; a memory cell array defined on the first dielectric layer; a second dielectric layer defined on the first dielectric layer, and covering the memory cell array; top wiring layers disposed in a third dielectric layer defined on the second dielectric layer; and global lines disposed in the row decoder region, and configured to transfer operating voltages to the pass transistors, wherein the global lines are disposed only in at least one bottom wiring layer from among the bottom and top wiring layers.

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Icheon-si, South Korea

Sang Hyun Sung