Samsung Electronics Co., Ltd.

University of Texas System

Korea Advanced Institute of Science and Technology

Sang-hyun Kim

Dong-gun Lee

Seong-sue Kim

Jong-Hyung Kwun

Won-chul Bang

Do-kyoon Kim

Robert Wendell Heath, Jr

Chan-Byoung Chae

Dong-Wan Kim

Chang-min Park

Byung-Gook Kim

Chang-Yeong Kim

Young-kyoo Hwang

In-Sung Kim

Ji-young Park

Chan-Uk Jeon

Eun Seok Ko

Sung-Chul Shin

Mun-Ja Kim

Chalykh Roman

Ho-taik Lee

Byoung-Hun Park

An apparatus and a method are provided to generate an ultrasound to be transmitted from an ultrasound irradiation device. The apparatus and the method include acquiring a medical image including anatomical information about a subject, and calculating characteristics of a tissue in the subject, which may affect propagation of the ultrasound based on the medical image. The apparatus and method also determine a parameter of the ultrasound to create a focal point on the subject using the calculated characteristics, and generate the ultrasound according to the determined parameter.

Method, apparatus, and system for generating ultrasound

A method of patterning a photoresist layer includes forming a photoresist layer on a substrate, exposing the photoresist layer to light using a first light source so as to induce a chemical change in the photoresist layer, performing a post-exposure bake process on the photoresist layer, the post-exposure bake process including irradiating the photoresist layer with at least two shots of laser light from a second light source such that the photoresist layer is heated to a first temperature, and performing a developing process on the photoresist layer after the post-exposure bake process, the development process selectively removing a portion of the photoresist layer.

Methods of manufacturing photomasks, methods of forming photoresist patterns and methods of manufacturing semiconductor devices

A reflective extreme ultraviolet (EUV) mask includes a mask substrate, a reflecting layer on an upper surface of the mask substrate, and an absorbing layer pattern on an upper surface of the reflecting layer, the absorbing layer pattern having an exposing region and a peripheral region, and the absorbing layer pattern including a grating pattern in the peripheral region to reduce reflectivity of light incident on the peripheral region.

Reflective extreme ultraviolet mask

Provided are a photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.

Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device

Methods of reducing a registration error of a photomask are provided. A method of reducing a registration error of a photomask may include identifying the registration error with respect to a pattern element in a pattern region of the photomask. Moreover, the method may include reducing a thickness of a portion of a non-pattern region of the photomask by irradiating an energy beam onto a location of the non-pattern region of the photomask that is spaced apart from the pattern element, to generate stress at the pattern element. Related photomasks and methods of manufacturing an integrated circuit are also provided.

Methods of reducing a registration error of a photomask, and related photomasks and methods of manufacturing an integrated circuit

A base station is capable of transmitting a signal in a wireless communication network. The base station decides channel state information matrices of respective channels by determining a state of the channels corresponding to respective transmission antennas. The base station calculates transmission beam forming vectors for the respective transmission antennas by a combination of a dot product and a cross product of the channel state information matrices. Thereafter, the base station beam-forms signals for the respective transmission antennas by using the respective transmission beam forming vectors, and transmitting the beam-formed signals.

Method and apparatus for beam-forming signal in multi user-MIMO wireless communication system

The present invention relates to a method of manufacturing a ferroelectric thin film device, and, more particularly, to a method of manufacturing a ferroelectric thin film device having high crystallinity, good surface roughness and high deposition efficiency through on-axis type sputtering, and to a ferroelectric thin film device manufactured using the method. The method of manufacturing a ferroelectric thin film device includes: depositing an SrRuO(SRO) thin film on an SrTiO(STO) substrate; and depositing a BiFeO(BFO) thin film on the deposited SRO thin film, wherein each of the thin films is deposited in a state in which the STO substrate is isolated from the ground. The method of manufacturing a ferroelectric thin film device is advantageous in that a ferroelectric thin film has a uniform surface, thus greatly decreasing the amount of leakage current and increasing remnant polarization.

Ferroelectric thin film device and method of manufacturing the same

Growing community of inventors

Hwaseong-si, South Korea

Sang-hyun Kim