Lg Electronics Inc.

Sang Hwan Cha

Young Hoon Shin

Won Ho Seo

Hyung Jin Lee

Tae Ho Lee

Chang Ju Rhee

Myung Ju Park

Soo Hoa Jeong

Disclosed is a maskless exposure method, where it is possible to perform a more precise optical alignment using a first pattern of a maskless exposure part and a second pattern of a main reference unit, and it is also possible to reduce generation of a blur in an exposed pattern.

Method and apparatus to adjust misalignment of the maskless exposure apparatus

The present invention relates to a maskless exposure apparatus and a method of manufacturing a substrate for a display using the same. In the present invention, a substrateis disposed on a scan stagethat can be moved in horizontal and vertical directions. Meanwhile, an optical unitfor generating light available for exposure is disposed above the substrate. Light that has passed though the optical unitis transferred to a DMD unit. The DMD unitis provided with DMDsfor selectively reflecting the light to form a pattern on the substrate. The DMDsare arranged in a plurality of rows in such a manner that DMDsin the same row are spaced apart by a predetermined distance from each other and DMDsin different rows partially overlap with each other at one end portions thereof. Thus, when the DMDsscan the substrate, scan marksare produced discontinuously in two straight lines. According to the present invention constructed as above, the scan marks are produced discontinuously on the substrate during exposure of the substrate, so that a user cannot recognize the presence of the scan marks when watching a display.

Maskless exposure apparatus and method of manufacturing substrate for display using the same

Growing community of inventors

Seocho-gu, South Korea

Sang Hwan Cha