Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Sang Don Jang

Sung Min Ahn

Tae Kyu Son

Sang Hyun Park

Hi Kuk Lee

Ho Seok Choi

Oui Serg Kim

Dong Seok Baek

Ja Yul Kim

Sang Joon Hong

Sang Woo Bae

Tae Hyun Kim

Hyang-Shik Kong

Jeong Min Kim

Yu-sin Yang

Cha-Dong Kim

Jung-In Park

Tae-hyun Kim

Woo-seok Ko

Yoo Chang Kim

Byeong Hwan Jeon

Jae Hyuk Chang

Won-Don Joo

Jung Hyeon Kim

Ja Choon Koo

Sang Hyun Yun

Chang Hoon Kim

Duke Kimm

Sue-Jin Cho

Sang Geun Park

Myung Ho Kim

Jung Woong Jang

Yong Seok Ihn

Ji Young Chu

Sang-il Hong

Shiva Ram Krishna

Song Woo Bae

Won Don Joo

A position adjusting unit according to some example embodiments includes a base; a mounting part, a driving unit, and a locking part on the base. The mounting part may be movably installed on the base and configured to have an optical element mounted thereto. The driving unit may include a plurality of actuators connected between the base and the mounting part. The driving unit may be configured to move the mounting part with respect to the base. The locking part may be configured to provide a fixing force for fixing a position of the mounting part. The locking part may be configured to release the fixing force when electricity is supplied to the locking part.

Position adjusting unit of optical element and maskless exposure apparatus including the same

Maskless lithographic apparatus measuring accumulated amount of light is provided. The maskless lithographic apparatus includes a light source which emits light, a stage on which a substrate is disposed, an optical system which converts the light into a beam spot array including a plurality of columns and a plurality of rows and irradiates the beam spot array onto the stage, a slit to which the beam spot array is irradiated and which passes an nth (n is a natural number) row of the beam spot array, an optical sensor which senses the nth row of the beam spot array which has passed through the slit, and a measuring unit which measures an accumulated amount of light in the nth row of the beam spot array sensed by the optical sensor.

Maskless lithographic apparatus measuring accumulated amount of light

Exemplary embodiments of the invention disclose an exposure apparatus and a method of tuning parameters of a chuck, which may reduce a time taken to level the chuck by previously tuning parameters of the chuck. The method of tuning parameters of a chuck includes detecting a tilt component of the chuck, performing chuck tilt adjustment to minimize the tilt component of the chuck, and tuning the parameters of the chuck if a residual tilt component is present after performing the chuck tilt adjustment.

Apparatus and method of controlling chuck, and exposure apparatus and control method thereof

A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The stage position measuring device includes a one-dimensional scale on the transferring stage; a one-dimensional scale reading head which is configured to overlap the one-dimensional scale, irradiate a measuring beam to the overlapped one-dimensional scale and measure a 1D y-axis coordinate of the transferring stage; a two-dimensional encoder on the transferring stage; and a two-dimensional encoder reading head which is configured to overlap the two-dimensional encoder, irradiate a measuring beam to the overlapped two-dimensional encoder and measure a 2D x-axis coordinate and a 2D y-axis coordinate of the transferring stage.

Stage transferring device and position measuring method thereof

An illumination optic system includes a convex mirror to reflect light from a light source to towards a lens. The light source is at a first focus position and the lens is at a second focus position of the mirror. The system also includes a reflector to reflect light not incident on the lens toward the convex mirror. The reflector has a light guide hole to guide light to the incidence surface of the lens.

Reflector structure of illumination optic system

A method of determining and controlling position and attitude information associated with a 6-degree-of-freedom stage includes: receiving, from a plurality of sensors associated with the 6-degree-of-freedom stage, displacement information associated with the 6-degree-of-freedom stage. A plurality of equations associated with the plurality of sensors are determined by a control unit based on the displacement information to represent an amount of change in position and attitude associated with each measurement axis of each of the plurality of sensors. The control unit determines position information and attitude information associated with the 6-degree-of-freedom stage using the equations. Movement of the 6-degree-of-freedom stage is caused, at least in part, to be controlled based on the position information, the attitude information, or both the position information and the attitude information. Three coordinate values associated with each valid measurement point of each of the plurality of sensors are associated with at least one degree of freedom.

Ultra-precision position control device and method for determining position and attitude information associated with a 6-degree-of-freedom stage thereof

Example embodiments are directed to a maskless exposure apparatus using off-axis alignment to form a virtual mask pattern on a substrate. The maskless exposure apparatus includes a movement unit on which the substrate is placed, a light source unit configured to output light, a projection unit configured to divide the light output from the light source unit into a plurality of spot beams to form the pattern and configured to project the spot beams to the movement unit, an alignment unit configured to output alignment light to align the substrate and a virtual mask, a beam imaging unit configured to capture the spot beams and the alignment light, and a controller configured to measure distances between the captured alignment light and at least two of the captured spot beams and configured to determine alignment between the virtual mask and the substrate based on the measured distances to control movement of the movement unit.

Maskless exposure apparatus and method

Disclosed herein are a maskless exposure apparatus configured to perform exposure by tilting a beam spot array with respect to a scan direction (Y-axis direction) thus preventing stitching stripes and a stitching method using the same. A step distance, in which exposure dose uniformity in a stitching area is within a tolerance range, is calculated using actual position data of beam spots constituting the beam spot array on an exposure plane, and if necessary, using beam power data and/or beam size data. As exposure is performed based on image data conforming to the step distance, the stitching area has a uniform exposure dose, enabling exposure without stitching stripes.

Maskless exposure apparatus and stitching exposure method using the same

According to example embodiments, a method of operating an exposure apparatus including a stage having a plurality of beam measurement devices, and an exposure head unit having a first set of exposure heads and a second set of exposure heads includes measuring a position of a first exposure head of the first set of exposure heads by moving the stage to coincide a first beam measurement device of the plurality of beam measurement devices with the first exposure head, setting the measured position of the first exposure head as a reference position, and measuring positions of the second set of exposure heads with respect to the reference position.

Exposure apparatus including the exposure head and control method thereof

Provided is a barrel support device for supporting a lens barrel. The barrel support device may include a guide frame configured to laterally support the lens barrel and tilt with the lens barrel, a rotation guide on a first end of the guide frame, the rotation guide being ring shaped and configured attach the lens barrel to the guide frame, and a ring-shaped tilting frame configured to support a second end of the guide frame and tilt the guide frame, wherein the guide frame, the rotation guide, and the tilting frame are configured to allow the lens barrel to pass therethrough.

Lens barrel support device and maskless exposure apparatus having the same

An example embodiment relates to an alignment device including an optical aligner system including a plurality of aligners configured to measure a position of a workpiece having a plurality of alignment marks, and an optical member. The optical member is configured to diverge alignment beams reflected from neighboring alignment marks of the plurality of alignment marks and transmit the beams to neighboring aligners of the plurality of aligners respectively if a distance between the neighboring aligners is greater than a distance between the neighboring alignment marks.

Workpiece alignment device

Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical unit, and a control method thereof. The maskless exposure apparatus includes the measurement optical unit including a photo sensor and an image sensor, and a control unit configured to generate and/or correct the exposure data using the information acquired by the measurement optical unit.

Maskless exposure apparatus having measurement optical unit to measure depths of focus of a plurality of beams and control method thereof

According to an example embodiment, a method to determine an exposure start position and orientation includes loading a substrate on a moving table. The substrate includes at least one alignment mark of a first set of alignment marks of a first pattern layer patterned thereon. At least one alignment mark of a second set of alignment marks of a second pattern layer is exposed on the substrate using maskless lithography. A position of the at least one alignment mark of the first set of alignment marks and a position of the at least one alignment mark of the second set of alignment marks on the substrate is measured. A relative orientation difference between a desired exposure start orientation and an obtained exposure start orientation is acquired using the measured positions of the at least one alignment mark of the first set of alignment marks and the at least one alignment mark of the second set of alignment marks. A relative position difference between a desired exposure start position and an obtained start position is acquired using the measured positions of the at least one alignment mark of the first set of alignment marks and the at least one alignment mark of the second set of alignment marks. An exposure start position and orientation compensated using the relative position difference and the relative orientation difference is determined.

Maskless exposure apparatus and method to determine exposure start position and orientation in maskless lithography

Example embodiments are directed to a maskless exposure device and an alignment method. The alignment method performs an overlay of each layer of a plurality of layers on a substrate using a virtual mask in a maskless exposure technique. The maskless exposure device and the alignment method use a virtual mask instead of a physical mask used in a conventional mask exposure, a virtual target mark instead of an alignment mark used in the conventional mask exposure, and perform an overlay per layer, such that the deposition exposure can be achieved in the maskless exposure.

Growing community of inventors

Suwon-si, South Korea

Sang Don Jang