Asml Netherlands B.v.

Asml Holding N.v.

Sandra Van Der Graaf

Martinus Hendrikus Antonius Leenders

Nina Vladimirovna Dziomkina

Erik Roelof Loopstra

Nicolaas Ten Kate

Frits Van Der Meulen

Stephen Roux

Richard Joseph Bruls

Paul Janssen

Matthew Lipson

Joseph Harry Lyons

Derk Servatius Gertruda Brouns

Robert Gabriël Maria Lansbergen

Matthias Kruizinga

Erik Willem Bogaart

Jeroen Dekkers

Beatrijs Louise Marie-Joseph Katrien Verbrugge

Gerrit Van Den Bosch

Maarten Mathijs Marinus Jansen

Jérôme François Sylvain Virgile Van Loo

Jorge Manuel Azeredo Lima

Marc Bruijn

Ronald Harm Gunther Kramer

Mohammad Reza Kamali

Sander Van Den Heijkant

Hans Jansen

Michel Riepen

Roelof Frederik De Graaf

Erik Henricus Egidius Catharina Eummelen

Cornelius Maria Rops

Henricus Wilhelmus Maria Van Buel

Rogier Hendrikus Magdalena Cortie

Antonius Johannus Van Der Net

Laurentius Johannes Adrianus Van Bokhoven

David Bessems

Takeshi Kaneko

Kornelis Tijmen Hoekerd

Anthonie Kuijper

Fabrizio Evangelista

Henricus Jozef Castelijns

Pieter Jacob Kramer

Vitaliy Prosyentsov

Arjan Hubrecht Josef Anna Martens

Adrianus Marinus Verdonck

Jeroen Thomas Broekhuijse

Alexandre Viktorovych Padiy

Robert Gabriel Maria Lansbergen

Jerome Francois Sylvain Virgile Van Loo

Servatius Derk

Joseph H Lyons

A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Mask assembly

A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.

Fluid handling structure, lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed in which a specific coating is applied to a specific surface. The coating is made from at least 99 wt % of at least one of the following: a transition metal oxide; a poor metal oxide, sulfide or selenide; a compound with the formula ATiOwhere A is an element from Group 2 of the Periodic Table; or TiOdoped with a metal from Group 3, 5 or 7 of the Periodic Table, wherein the coating is less than or equal to 49 nm thick.

Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method

A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.

Lithographic apparatus and a method of operating the apparatus

A sensor for an immersion system is disclosed. The sensor comprises: a sensing device, a transparent layer and an opaque patterning layer. The sensing device is configured to sense a property of a beam of radiation. The transparent layer is configured to allow the passage of a beam of radiation therethrough. The transparent layer covers the sensing device. The opaque patterning layer is configured to impart a pattern to the beam of radiation. In the patterning layer is an opening in which is located an infilling material. The infilling material is transparent to the beam of radiation and has a similar refractive index to that of the transparent layer.

Sensor, a table and lithographic apparatus

Growing community of inventors

's-Hertogenbosch, Netherlands

Sandra Van Der Graaf