Texas Instruments Corporation

Sandra S Zheng

Patrick Ian Oden

William Craig McDonald

James Carl Baker

Lance W Barron

Mark James Smiley

Douglas Jay Levack

Ronald Dean Powell

Freidoon Mehrad

Lancy Y Tsung

Jie Xia

Cindy Pan

In described examples, a microelectromechanical system (MEMS) includes a first element and a second element. The first element is mounted on a substrate and has a first contact surface. The second element is mounted on the substrate and has a second contact surface that protrudes from the second element to form an acute contact surface. The first element and/or the second element is/are operable to move in: a first direction, such that the first contact surface comes in contact with the second contact surface; and a second direction, such that the second contact surface separates from the first contact surface.

Isolated protrusion/recession features in microelectromechanical systems

Isolated protrusion/recession features in a micro electro mechanical system

A method, which forms an air-bubble-free thin film with a high-viscosity fluid resin, initially dispenses the fluid resin on an outer region of a semiconductor wafer while the semiconductor wafer is spinning, and then dispenses the fluid resin onto the center of the semiconductor wafer after the semiconductor wafer has stopped spinning.

Method of forming a thin film that eliminates air bubbles

A method of forming a micro-electromechanical systems (MEMS) pixel, such as a DMD type pixel, by forming a substrate having a non-planar upper surface, and depositing a photoresist spacer layer upon the substrate. The spacer layer is exposed to a grey-scale lithographic mask to shape an upper surface of the spacer layer. A control member is formed upon the planarized spacer layer, and an image member is formed over the control member. The image member is configured to be positioned as a function of the control member to form a spatial light modulator (SLM). The spacer layer is planarized by masking a selected portion of the spacer layer with a grey-scale lithographic mask to remove binge in the selected portion.

Operation/margin enhancement feature for surface-MEMS structure; sculpting raised address electrode

A method of forming a micro-electromechanical systems (MEMS) pixel, such as a DMD-type pixel, by depositing a photoresist spacer layer upon a substrate. The photoresist spacer layer is exposed to a grey-scale lithographic mask to shape an upper surface of the photoresist spacer layer. A control member is formed upon the shaped spacer layer, and has a sloped portion configured to maximize energy density. An image member is configured to be positioned as a function of the control member to form a spatial light modulator (SLM).

Sloped electrode element for a torsional spatial light modulator

A method for testing the image displacement of a reticle following a change in illumination comprising the steps of taking a first image displacement measurement with a test reticle ( ) having a variable linewidth (L) and a variable pitch size (s) on an image displacement mark ( ), changing the illumination conditions of the photolithographic equipment and taking a second image displacement measurement with the test reticle ( ) to determine an image displacement offset due to changes in illumination, is disclosed.

Image displacement test reticle for measuring aberration characteristics of projection optics

A method to form an embedded FLASH integrated circuit with reduced processing steps is described. In the method a partial etch is performed on the control gate region of a polycrystalline silicon film ( ). A multiple etch process is then used to simultaneously form the FLASH memory cell gate stack ( ), the NMOS gate structure ( ) and the PMOS gate structure ( ).

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Plano, TX, United States of America

Sandra S Zheng