Forschungszentrum Juelich Gmbh

Sony Deutschland Gmbh

Deutsches Krebsforschungszentrum

Forschungszentrum Julich Gmbh

Sandra Gilles

Dirk Mayer

Andreas Offenhaeusser

Akio Yasuda

Jurina Wessels

Bjoern Luessem

Manfred Wiessler

Daniel Schwaab

Peter Lorenz

Heinz Fleischhacker

Ranjita Ghosh-Moulick

Andreas Offenhäuser

The present invention concerns a method for applying a first metal onto a second metal, an isolator or semiconductor substrate by a Diels-Alder reaction, in particular a Diels-Alder reaction with inverse electron demand. The present invention further concerns the binding units L 1960 and F 160.

Method for applying a first metal onto a second metal, an isolator or semiconductor substrate, and the respective binding units

A method and associated substrate is provided for applying a layer or pattern of metal on a substrate. The method includes providing a target substrate, immobilizing a layer of polymeric material on the target substrate, and applying and immobilizing a layer or pattern of metal on the layer of polymeric material on the target substrate using a stamp onto which the layer or pattern of metal has previously been applied, by bringing the stamp into conformal contact with the target substrate.

Method of preparing a substrate having a layer or pattern of metal on it

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Aachen, Germany

Sandra Gilles