Asml Netherlands B.v.

Sander Kerssemakers

Martinus Joseph Kok

Hans Butler

Marc Wilhelmus Maria Van Der Wijst

Olav Johannes Seijger

Christiaan Alexander Hoogendam

Cornelius Adrianus Lambertus De Hoon

Mark Johannes Magielsen

Thijs Verhees

Johannes Jacobus Matheus Baselmans

Martinus Hendrikus Antonius Leenders

Nicolaas Rudolf Kemper

Frank Johannes Jacobus Van Boxtel

Wilhelmus Petrus De Boeij

Robert Gabriël Maria Lansbergen

Jan Jaap Kuit

Reinder Teun Plug

Günes Nakiboglu

Mark Constant Johannes Baggen

Carolus Johannes Catharina Schoormans

Petrus Franciscus Van Gils

Martinus Van Duijnhoven

Henricus Gerardus Tegenbosch

Robertus Mathijs Gerardus Rijs

Robertus Nicodemus Jacobus Van Ballegoij

Hendrikus Herman Marie Cox

Niels Johannes Maria Bosch

Bart Smeets

Hubertus Petrus Leonardus Henrica Van Bussel

Lucas Kuindersma

Michael Johannes Christiaan Ronde

Gerard Johannes Boogaard

Jelmer Mattheüs Kamminga

Erwin Antonius Henricus Franciscus Van Den Boogaert

Jessica Henrica Anna Verdonschot

Gerben Frank De Lange

A vessel () for an EUV radiation source, the vessel comprising a first opening () for accessing an interior () of the vessel, a first access member () configured to allow or prevent access to the interior of the vessel through the first opening, a second opening () for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member () arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening.

Vessel for a radiation source

An apparatus having: a system configured to measure an object; a base structure; an object support constructed to hold the object, the object support movably supported on the base structure; a balance mass configured to absorb a reaction force arising from movement of the object support; an actuator connected to the balance mass and the base structure, the actuator configured to apply a force to the balance mass and the base structure; a sensor configured to produce a signal for a measured characteristic of the base structure corresponding to a disturbance, or its effect, acting on the base structure; and a control system configured to determine, based on at least the signal for the measured characteristic of the base structure, a signal for the actuator to apply a force to the base structure and/or the balance mass.

Lithographic apparatus and device manufacturing method

A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.

A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.

Lithographic apparatus and method

A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber () in communication with the compartment and a perforated plate (), having a plurality of through-holes (), between the chamber and the compartment.

Lithographic apparatus

A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.

A substrate support, configured to support a substrate during a process within a lithography system, includes a lifting structure configured to move the substrate between a first position, in which a lifting face of the lifting structure supports the substrate at a position set apart from a support surface of the substrate support, and a second position, in which the lifting structure does not prevent the substrate from being supported by a support surface of the substrate support; wherein, in moving between the first and second positions, the substrate moves in a combination of movement substantially perpendicular to a plane parallel to the support surface and movement substantially parallel to the support surface.

Support structure, inspection apparatus, lithographic apparatus and methods for loading and unloading substrates

A substrate table positioning device that is supported by four bearing elements is provided. The substrate table positioning device also includes a balance mass. Two of the bearing elements support the base frame in such a way that they can move in a vertical direction independently of the other bearing elements. This can be achieved by using a hinge. This structure of substrate table positioning device has a higher lowest Eigen frequency of oscillation than that of substrate table positioning devices supported by three bearing elements. As such, the balance mass is not excited by typical vibrations that occur in the lithographic apparatus. This enables better positional control of the substrate table. It also enables at least some of the dimensions of the frame elements of the balance mass to be reduced.

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

An inspection apparatus for measuring a property of a substrate (W), includes a base frame, a substrate table () to hold the substrate, an illumination system arranged to direct a beam of radiation onto the substrate and a sensor arranged to detect radiation reflected off the substrate. Two balanced positioning systems displace the substrate table and sensor relative to the base frame in several directions. Each balanced positioning system includes a balance mass (), a bearing arrangement () to movably support the balance mass and tracks effective to guide the displacement in each direction. A motor arrangement causes the displacement in each direction. The balance mass is positioned relative to the track arrangement such that the centers of gravity of each balance mass and the substrate table or the sensor are substantially aligned in the direction substantially perpendicular to the plane including the direction of displacement.

Inspection method and apparatus

To inspect all portions of the substrate the substrate table can be moved rotationally and linearly. Furthermore the detector can be moved rotationally. This enables all portions of a surface of the substrate to be inspected from all angles in a plane parallel to the substrate. Less linear motion is needed, so the apparatus occupies a smaller volume and generates smaller vibrations.

Apparatus for angular-resolved spectroscopic lithography characterization and device manufacturing method

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Eindhoven, Netherlands

Sander Kerssemakers