Koninklijke Philips Corporation N.V.

Asml Netherlands B.v.

Sander De Putter

Jozef Maria Finders

Marcel Breeuwer

Bernardo Kastrup

Marcel Johannes Quist

Bertus Johan Vleeming

A method to determine an improved configuration for a lithography apparatus, a computer-readable medium for use in carrying out the method, and a lithography apparatus are disclosed. In an example, the method involves intelligent selection of one or more device features to measure and use in a routine to optimize the configuration of the lithography apparatus. According to an example, the method comprises imposing a target error profile to one or more device features for which measurement data is not sufficient, for example in a regions where a selected device feature is sparsely distributed.

Lithographic apparatus and methods for determining an improved configuration of a lithographic apparatus

The present invention relates to a system () and method for registration of medical image (). Furthermore the invention relates to a computer program () for registration of medical images (), when the computer program () is executed in a computer (). In order to provide a more accurate registration transformation of medical images it is suggested to detect insufficiently similar areas () and to exclude them from the registration by means of an exclusion mask () that indicates which pixels/voxels should not be included during the registration process.

System and method for registration of medical images based on insufficiently similar image areas

A method of determining wall stress in an abdominal aortic aneurysm is disclosed. The method includes determining, from anatomical image data, respective first stress values at locations on the wall, based on the aorta having substantially uniform stiffness. The primary direction of stress those locations are determined, and the locations of calcified regions () are then determined. The distance to the nearest calcified region is then determined for each location not corresponding to a calcified region, and the additional stress caused by the calcified regions is then determined from values stored in a memory.

Method and apparatus for determining stress in an anatomical structure

In a multiple-exposure lithographic process a developed resist pattern derived from a first exposure is present within a second resist layer that is exposed in a second exposure of the multiple-exposure lithographic process. The second mask pattern used in the second exposure process includes at least one localized adjustment to at least one feature thereof to compensate for scattering effects of the developed resist pattern that is present when the second exposure is performed.

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Eindhoven, Netherlands

Sander De Putter