Asml Netherlands B.v.

Sander Catharina Reinier Derks

Thibault Simon Mathieu Laurent

Johan Gertrudis Cornelis Kunnen

Martijn Houben

Hendrikus Johannes Marinus Van Abeelen

Armand Rosa Jozef Dassen

Johannes Henricus Wilhelmus Jacobs

Ronald Van Der Ham

Ruud Hendrikus Martinus Johannes Bloks

Adrianus Hendrik Koevoets

Jim Vincent Overkamp

Ivo Adam Johannes Thomas

Gerben Pieterse

Gregory Martin Mason Corcoran

Marinus Jan Remie

Jacobus Cornelis Gerardus Van Der Sanden

Pieter Lein Joseph Gunter

Coen Cornelis Wilhelmus Verspaget

Sjoerd Nicolaas Lambertus Donders

Raymond Wilhelmus Louis Lafarre

Franciscus Johannes Joseph Janssen

Jan Steven Christiaan Westerlaken

Daniel Jozef Maria Direcks

Gerardus Adrianus Antonius Maria Kusters

William Peter Van Drent

Maurice Wilhelmus Leonardus Hendricus Feijts

Erik Johan Arlemark

Pieter Gerardus Mathijs Hoeijmakers

Katja Cornelia Joanna Clasina Moors

Violeta Navarro Paredes

Christiaan Alexander Hoogendam

Nicolaas Ten Kate

Frits Van Der Meulen

Harmen Klaas Van Der Schoot

Frank Johannes Jacobus Van Boxtel

Leon Martin Levasier

David Ferdinand Vles

Gosse Charles De Vries

Martinus Agnes Willem Cuijpers

Koos Van Berkel

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Christiaan Louis Valentin

Hendrikus Herman Marie Cox

Wilfred Edward Endendijk

Alain Louis Claude Leroux

Stan Henricus Van Der Meulen

Alexander Nikolov Zdravkov

Johannes Fransiscus Maria Velthuis

Manon Elise Will

Dries Vaast Paul Hemschoote

Ronald Cornelis Gerardus Gijzen

Patrick Willem Paul Limpens

Eric Willem Felix Casimiri

Sumant Sukdew Ramanujan Oemrawsingh

Joost De Hoogh

Güneş Nakìboglu

Johannes Wilhelmus Mollen

Paul Comé Henri De Wit

Evert Auke Rinze Westerhuis

Marcel Mathijs Theodore Dierichs

Wassim Zein Eddine

A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W mK.

Contamination trap

A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method

A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method

A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20&#xb0; C. in at least one direction.

Temperature sensing probe, burl plate, lithographic apparatus and method

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

Lithographic apparatus

A method of performing a lithographic exposure of a substrate, the substrate being held on a substrate table, the substrate table comprising a cooling system operative to cool the substrate table, the method comprising performing an alignment measurement of the substrate, applying heat to the substrate table to reduce cooling of the substrate table provided by the cooling system, the heat being applied between a time at which the alignment measurement is performed and a time at which the lithographic exposure is performed and performing the lithographic exposure of the substrate.

Lithographic apparatus and method

A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus () for cooling the substrate, wherein the cooling apparatus comprises a cooling element () located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

An apparatus comprising at least one sealing aperture () comprising a hollow part (), having an inner surface (), extending at an interface between different zones () of the apparatus; and a member () positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.

Apparatus, a device and a device manufacturing method

Growing community of inventors

Budel, Netherlands

Sander Catharina Reinier Derks