Asml Netherlands B.v.

Sander Baltussen

Marcus Adrianus Van De Kerkhof

Johan Hendrik Klootwijk

Richard Joseph Bruls

Pieter-Jan Van Zwol

Arnoud Willem Notenboom

Dzmitry Labetski

Hendrikus Gijsbertus Schimmel

Johannes Christiaan Leonardus Franken

Adrianus Johannes Maria Giesbers

Dennis De Graaf

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Evgenia Kurganova

Aleksandar Nikolov Zdravkov

Reinier Theodorus Martinus Jilisen

Alexey Sergeevich Kuznetsov

Zhuangxiong Huang

Ties Wouter Van Der Woord

Mahdiar Valefi

Kerim Nadir

Peter Simon Antonius Knapen

Cristian Bogdan Craus

Alexander Ludwig Klein

Hendrikus Jan Wondergem

Christian Felix Wählisch

Chuangxin Zhao

Jan Groenewold

Pär Mårten Lukas Broman

Sietse Wijtvliet

Alisia Mariska Willems-Peters

A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

Method of manufacturing a membrane assembly

An apparatus comprising: a position monitoring system configured to determine the position of the substrate with respect to a projection system configured to project a radiation beam through an opening in the projection system and onto a substrate, wherein a component of the position monitoring system is located beneath the projection system in use; and a baffle disposed between the opening and the component.

Lithographic apparatus and related methods

A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.

Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method

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Castenray, Netherlands

Sander Baltussen