Globalfoundries Inc.

Globalfoundries U.S. Inc.

Sandeep Torgal

Venkata N R Vanukuru

Umesh Kumar Shukla

Structures that include a peaking inductor and a T-coil, and methods associated with forming such structures. A back-end-of-line interconnect structure includes a first metallization level, a second metallization level, and a third metallization level arranged between the first metallization level and the second metallization level. The T-coil includes a first inductor with a first coil arranged in the first metallization level and a second inductor with a second coil arranged in the second metallization level. A peaking inductor includes a coil arranged in the third metallization level. The first coil of the first inductor, the second coil of the second inductor, and the coil of the peaking inductor are stacked in the back-end-of-line interconnect structure with an overlapping arrangement.

Peaking inductor embedded within a T-coil

Embodiments of the present disclosure provide an integrated circuit (IC) structure including: a first conductive layer of a device structure; a second conductive layer of the device structure vertically separated from the first conductive layer, wherein a load resistor couples the second conductive layer to ground; a t-coil having a first end coupled to the first conductive layer, and a second end coupled to the second conductive layer; and a variable capacitor having a first end coupled to the first conductive layer, and a second end coupled to the second conductive layer, the variable capacitor having an adjustable capacitance.

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Bengaluru, India

Sandeep Torgal