Phase Dynamics, Inc.

Texas Instruments Corporation

Other

Technology Network International, Inc.

Samuel R Shortes

Bentley N Scott

Justin D Pendleton

Thomas C Penn

Vernon R Porter

Edwin G Millis

Neal Cooper

An apparatus for washing a set of objects. The apparatus includes a washing chamber and a ROX generator fluidically connected to the washing chamber via a fluid conduit having a distal end that terminates at the washing chamber. The ROX generator is configured to provide reactive oxidizers to a carrier liquid to form a cleaning liquid with ROX cleaning bubbles, wherein the cleaning liquid is transported through the fluid conduit and into the washing chamber.

Cleaning apparatus using reactive oxidizers

Systems, methods, and probe devices for electronic monitoring and characterization using single-ended coupling of a load-pulled oscillator to a system under test.

System and method for monitoring substances and reactions

A process for monitoring the state of microcrystalline change of solid materials, by observing the frequency of a load-pull oscillator which is RF-coupled to the material under test (preferably by a simple single-ended RF probe). Areas where this technique is of particular interest are in monitoring the curing of shaped aerodynamic composite materials, and in monitoring the curing of concrete and cement compositions.

Method for monitoring the state of microcrystalline change of solid

Devices, methods and systems using load-pulled electronic monitoring

RF probe for montoring composition of substances

A system and method for monitoring conditions in a fluid medium. A stream of the fluid medium is flowed through a fluid container which is electrically configured as a transmission line segment and which is electrically connected to load to UHF or microwave oscillator. The oscillator is not isolated from the load, and is operated free-running, at a starting frequency which is chosen to provide a particularly strong shift in permittivity of the fluid medium, as the chemical reaction progresses. Preferably the frequency and insertion loss of the oscillator are monitored, to gauge the progress of the reaction.

Marksmanship training apparatus is used with air guns or weapons firing blank cartridges and comprises a housing member with an attached muzzle alignment tube for insertion into the bore of the barrel of the weapon and includes sealing apparatus around the muzzle alignment tube to minimize leakage of gas between the bore and the muzzle alignment tube and to prevent the gas from pushing the muzzle alignment tube out of the bore. The housing member includes a switch which is activated by the gas to complete an electrical circuit positioned in the housing to cause light energy to be emitted from the housing member.

Marksmanship training apparatus

Marksmanship training apparatus which provides for simulated firing of projectile-type weapons is disclosed and comprises a substitute cartridge and a receiver/detector target device. The substitute cartridge is self contained and includes a power source, an energy emitting device which emits a pulse or pulses or energy with predetermined characteristics, a lens device to concentrate the emitted energy, an energy activation device and a transfer device to transfer the energy from the firing mechanism of the weapon to the energy activation device to activate same. The receiver/detector target device includes devices to detect the presence of the pulse or pulses of energy while ignoring the ambient light level surrounding the target device. The target device initiates a time cycle and provides a display of the elapsed time from initiation to the receipt of a hit from the pulse or pulses of energy emitted from the substitute cartridge in the weapon. An audio indication is also provided when a hit occurs.

Cartridge and target device for markmanship training

Method and apparatus for removing a photoresist layer from a substrate surface of different material, such as a semiconductor slice, in the fabrication of an electronic structure, involving exposure of the photoresist layer to an ozone-containing gaseous atmosphere in a reaction zone of a reactor. The ozone is present as an active reagent in the gaseous atmosphere to which the layer of photoresist material is exposed in an amount sufficient to react with all of the photoresist material in the layer thereof, with the photoresist material being removed from the underlying substrate surface in response to its exposure to the ozone. The photoresist material being treated by the ozone for stripping thereof may be either a negative or positive photoresist. Gaseous reaction products resulting from treatment of the substrate and removal of the photoresist layer therefrom are directed through an ozone reduction chamber prior to the discharge of the exhaust gases created by the reaction of the ozone with the photoresist material, wherein any excess ozone contained in the exhaust gases is reduced to molecular oxygen.

Method for removing photoresist layer from substrate by ozone treatment

Method and apparatus for cleaning the surface of a slice of semiconductor material through the use of a liquid spray, wherein the liquid spray is delivered at an angle to the exposed surface of a rotating semiconductor slice at a controlled pressure and velocity, and strikes the surface of the semiconductor slice substantially along a linear path coinciding with the diameter of the slice. The apparatus includes an upstanding pedestal having a slice-supporting surface on which the slice of semiconductor material to be cleaned is disposed. The pedestal is mounted within a housing which includes a motor for imparting rotation to the pedestal and a vacuum pump for inducing a suction in openings provided in the slice-supporting surface of the pedestal so as to retain the slice in place when rotary movement is imparted thereto. A spray nozzle for delivering a flat fan-shaped spray pattern is disposed within the housing, the spray nozzle being positioned above the level of the slice-supporting surface for dispensing a liquid spray onto the exposed surface of the slice positioned thereon. The housing is also provided with a transparent dome-shaped cover overlying the upstanding pedestal and the spray nozzle to define a cleaning chamber. The cover in its closed position completes an electric circuit operating the motor and the vacuum pump to impart rotation to the pedestal and to retain the semiconductor slice upon the surface of the pedestal by inducing suction in the openings provided therein. De-ionized water is delivered from the spray nozzle as a liquid spray to the surface of the semiconductor slice at a high pressure and velocity to produce a corona discharge for effecting a cleaning operation of the exposed surface of the semiconductor slice wherein particulate surface debris of a particle size smaller than the width of the theoretically determined dead space layer associated with the exposed slice surface is removed therefrom.

Growing community of inventors

Highland Village, TX, United States of America

Samuel R Shortes