Ramot University Authority for Applied Research and Industrial

Other

Samuel Goldsmith

Raymond L Boxman

Menachem Nathan

Hanan Yaloz

Naum Parkansky

Amir Ben-Shalom

Larisa Kaplan

Michael Keidar

Isak I Beilis

Hanan Rosenthal

A process and apparatus for depositing thin films and coatings using a vacuum arc plasma source having hot, non-consumable anode is described. Plasma and macroparticles of the cathode material are emitted from the cathode. Part of this material arrives at the hot refractory anode, where it is re-evaporated without macroparticle generation. Substrates exposed to the vapor flow from the anode, but shielded from a direct line of sight with the cathode, are coated with cathode material without macroparticle inclusions.

Deposition of coatings and thin films using a vacuum arc with a non-consumable hot anode

The present invention pertains to a method of controlling the microstructure and service properties of electrically conductive transparent and other materials by passing an electrical current through the materials while simultaneously employing an additional process. Examples of the additional process include heating, sintering, deposition, casting, electrical arcing, and immersion in liquids. In one embodiment of the present invention, the additional process is deposition of a transparent conductive coating material while passing a current through the deposited coating along the surface of the coated material.

Method of producing transparent and other electrically conductive

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Herzliya, Israel

Samuel Goldsmith