Az Electronic Materials (luxembourg) S.a.r.l.

Az Electronic Materials USA Corp.

Merck Patent Gmbh

Salem K Mullen

Huirong Yao

JoonYeon Cho

Munirathna Padmanaban

Elizabeth Wolfer

Douglas S McKenzie

Clement Anyadiegwu

Alberto D Dioses

M Dalil Rahman

Jianhui Shan

Takanori Kudo

Venkata Gopal Reddy Chada

Hengpeng Wu

Ping-Hung Lu

Guanyang Lin

Medhat A Toukhy

Zhong Xiang

Dalil M Rahman

Douglas Mckenzie

Joonyeon Cho

The present invention relates to a novel composition with improved stability containing soluble, multi-ligand-substituted metal compound, a polyol compound and a solvent useful for filling material on photoresist patterns with good trench or via filling properties of microlithographic features, where the filled patterns having good plasma etch resistance in oxygen based plasmas and are used as a hard mask in forming fine patterns on semiconductor substrates by pattern transfer of this hard mask. The present invention further relates to using the novel composition in methods for manufacturing electronic devices.

Metal hardmask composition and processes for forming fine patterns on semiconductor substrates

The present invention relates to novel compositions comprising a metal component selected from a group chosen from at least one polyoxometalate, at least one heteropolyoxometalate and a mixture thereof; and, at least one organic component. The present invention also relates to methods of preparing the nanorod arrays and the nanorod materials and films. The present invention also relates to novel compositions to generate metal-oxide rich films, and also relates to processes for via or trench filling, reverse via or trench filling and imaging with underlayers. The materials are useful in wide range of manufacturing applications in many industries, including the semiconductor devices, electro-optical devices and energy storage industry.

Polyoxometalate and heteropolyoxometalate compositions and methods for their use

The present invention relates to a novel spin coatable composition comprising The present invention further relates to processes using the novel compositions.

Spin coatable metallic hard mask compositions and processes thereof

The present disclosure relates to soluble, multi-ligand-substituted metal compounds with improved stability as well as compositions made from them and methods of their use.

Stable metal compounds, their compositions and methods

The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use. Specifically, the invention pertains to compounds having the following structure (I) wherein M is a metal and n is 1 to 20, and wherein at least one of R, R, R, and Ris i) and at least at least one of R, R, R, and Ris ii), where i) is a silicon bearing organic moiety having at least 2 carbons, and ii) is an organic moiety. The invention also relates to spin-coatable compositions of compounds of structure (I) dissolved into a solvent. The present invention further relates to processes using this spin coatable composition to form a coating on a patterned substrate. 

Stable metal compounds as hardmasks and filling materials, their compositions and methods of use

The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R)(R) methylene moiety where Rand Rare independently H, C-Calkyl, C-Ccycloalkyl or C-Caryl; Ar, Ar, Arand Arare independently phenylenic and naphthalenic moiety, Rand Rare independently hydrogen or C-Calkyl; and Rand Rare independently hydrogen or C-Calkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.

Antireflective coating compositions and processes thereof

The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where Ris C-Calkyl, Ris C-Calkyl, Rand Rare independently hydrogen or C-Calkyl, and Ar' and Ar&#x2033; are independently phenylenic, or naphthalenic derived moieties, Rand Rare independently &#x2014;OH or &#x2014;(CH)OH where n=2-4, and Rand Rare independently hydrogen or C-Calkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.

Antireflective coating composition and process thereof

The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1):-A-B-C-&#x2003;&#x2003;(1)where A is a fused aromatic ring, B has a structure (2), and C is a hydroxybiphenyl of structure (3) where Ris C-Calkyl and Ris C-Calkyl. The invention further relates to a process for forming an image using the composition.

A novel antireflective coating composition is provided, said antireflective coating composition comprising a) a compound of formula 1, b) a thermal acid generator, (c) at least one polymer, wherein Uand Uare independently a C-Calkylene group; V is selected from a C-Calkylene, arylene and aromatic alkylene; W is selected from H, C-Calkyl, aryl, alkylaryl and V&#x2014;OH; Y is selected from H, W, and UC(O)OW, wherein Uis independently a C-Calkylene group, and m is 1 to 10. Also provided are methods using said compositions as antireflective coatings for substrates in lithographic processes.

Antireflective compositions and methods of using same

Antireflective coating compositions and related polymers are disclosed.

Antireflective coating compositions

The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a strong acid upon irradiation and a photobleachable dye. The invention further provides for a process for imaging the photoresist of the present invention, especially where the thickness of the photoresist is up to 200 microns and where the process comprises a single exposure step.

Growing community of inventors

Florham Park, NJ, United States of America

Salem K Mullen