Applied Materials, Inc.

Sage Toko Garrett Doshay

Ludovic Godet

Siddarth A Krishnan

Rutger Meyer Timmerman Thijssen

Mingwei Zhu

Chien-An Chen

Naamah Argaman

Pinkesh Rohit Shah

Wayne McMillan

Tapashree Roy

Wayne Mcmillan

Embodiments described herein relate to methods for fabricating optical devices. The methods described herein enable the fabrication of one or more optical devices on a substrate with apertures surrounding each of the optical devices having a plurality of structures. One embodiment of the methods described herein includes disposing an aperture material layer on a surface of a substrate, disposing a structure material layer over the apertures and the surface of the substrate, disposing a hardmask over the apertures and the structure material layer, disposing a patterned photoresist over the hardmask, the patterned photoresist defining exposed hardmask portions, removing the exposed hardmask portions to expose structure portions of the structure material layer, and removing the structure portions to form a plurality of structures between the apertures over regions of the surface of the substrate.

Apertures for flat optical devices

Embodiments of the present disclosure generally relate to optical devices. Specifically, embodiments of the present disclosure relate to optical devices with one or more optical component circuits. The optical devices including one or more optical component circuits prevent the user from exposure to light when a conductive pathway is interrupted via aperture breakage, for example, from the user dropping the substrate, or from the user dropping the optical device. The conductive pathway allows for current to flow from a power source through the apertures and to one or more light sources and, in some embodiments, one or more light detectors. Aperture breakage resulting in the interruption of the conductive pathway prevents current from being provided to the one or more light sources and/or one or more light detectors to prevent (e.g., automatically prevent) light exposure to the user.

Integrated conductive apertures for optical devices

Embodiments of the present disclosure relate to methods for fabricating optical devices. One embodiment of the method includes disposing a structure material layer on a surface of a substrate and disposing a patterned photoresist over the structure material layer. The patterned photoresist has at least one device portion and at least one auxiliary portion. Each device portion and each auxiliary portion exposes unmasked portions of the structure material layer. The unmasked portions of structure material layer corresponding to each device portion and each auxiliary portion are etched. The etching the unmasked portions forms at least one optical device having device structures corresponding to the unmasked portions of at least one device portion and at least one auxiliary region having auxiliary structures corresponding to the unmasked portions of at least one auxiliary portion.

Photoresist loading solutions for flat optics fabrication

Systems and methods herein are related to the formation of optical devices including stacked optical element layers using silicon wafers, glass, or devices as substrates. The optical elements discussed herein can be fabricated on temporary or permanent substrates. In some examples, the optical devices are fabricated to include transparent substrates or devices including charge-coupled devices (CCD), or complementary metal-oxide semiconductor (CMOS) image sensors, light-emitting diodes (LED), a micro-LED (uLED) display, organic light-emitting diode (OLED) or vertical-cavity surface-emitting laser (VCSELs). The optical elements can have interlayers formed in between optical element layers, where the interlayers can range in thickness from 1 nm to 3 mm.

Multi stack optical elements using temporary and permanent bonding

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Saratoga, CA, United States of America

Sage Toko Garrett Doshay