Kabushiki Kaisha Topcon

Saeko Uchida

Yasuo Kato

Takeshi Nakamura

Kunihiko Hara

An objective refraction measurement apparatus includes a separate chart having a pair of charts arranged separately, an optical system for projecting the separate chart to an eye to be examined through a focusing lens and a diaphragm having a pair of through holes arranged corresponding to the separate arrangement of the pair of charts, an operating unit for performing focusing operation to the eye, and a control unit for moving the focusing lens on the basis of the focusing operation along the optical axis direction by the operating unit to obtain the projection images of the pair of charts in the separate chart to the eye in an identical condition or a non-identical condition, thereby to perform a subjective measurement of the eye.

Objectives refraction measuring apparatus

An objective refraction measuring system of an ophthalmic apparatus measures a refractive power of an eye to be examined in an objective manner under the condition that a gazing chart of a gazing target system is fixed to the eye to be examined. An arithmetic-logic unit obtains an objective measurement value of the eye to be examined on the basis of the measurement result by the objective refraction measuring system and the gazing target system. A control unit controls a continuous objective measurement while fogging the gazing chart after setting the gazing chart of the gazing chart system to a far-sight position of the eye to be examined which is obtained by using the gazing target system. With such measurement, the continuous objective measurement values by fogging the gazing chart of the gazing target system is obtained from the far-sight position based upon the objective measurement of the eye to be examined. Thus, the limit of the adjustment force of the eye to be examined is precisely measured.

Growing community of inventors

Okayama, Japan

Saeko Uchida