Mitsubishi Gas Chemical Company, Inc.

Saeko Sato

Yuiga Asai

Tomotaka Wada

Kazuki Kouno

Yohei Abiko

Shinji Sekiguchi

Takuma Hanaoka

Aoi Daito

Provided are an amine compound represented by the following formula (1), which has a low active hydrogen equivalent weight and thus is capable of providing a cured product having good properties because the amine compound has sufficient curability even though the amount of amine compound blended in an epoxy resin composition is small when the amine compound is used as an epoxy resin curing agent, and an amine composition and an epoxy resin curing agent, which contain the compound:  wherein A is a 1,2-phenylene group, a 1,3-phenylene group, or a 1,4-phenylene group.

Amine compound, amine composition, and epoxy resin curing agent

A polyimide resin including a structural unit A derived from a tetracarboxylic dianhydride and a structural unit B derived from a diamine compound, wherein the structural unit A includes a structural unit (A-1) derived from a compound represented by the following formula (a-1), and the structural unit B includes a structural unit (B-1) derived from a compound represented by the following formula (b-1):  wherein m and n in the formula (b-1) each independently are an integer of 0 or 1.

Polyimide resin and polyimide resin composition

A coating film formed by curing of an epoxy resin composition containing at least an epoxy resin, an epoxy resin curing agent and a solvent, wherein the coating film contains the solvent in a ratio of 1% by mass or more and 20% by mass or less, and the epoxy resin curing agent is a reaction product of the following (A) and (B). (A) At least one selected from the group consisting of metaxylylenediamine and paraxylylenediamine. (B) At least one selected from the group consisting of an unsaturated carboxylic acid represented by the following formula (1) and a derivative thereof: wherein Rand Reach independently represent a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aralkyl group having 1 to 8 carbon atoms, or an aryl group.

Coating film having chemical resistance

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Kanagawa, Japan

Saeko Sato