Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Az Electronic Materials (korea) Ltd.

Az Electronic Materials (japan) K.k.

Sae-Tae Oh

Hi-Kuk Lee

Sang-Hyun Yun

Deok-Man Kang

Jae-young Choi

Min-Soo Lee

Hong-Sick Park

Jin-Ho Ju

Cha-Dong Kim

Yu-Kyung Lee

Sung-Chul Kang

Jung-In Park

Youn-Suk Kim

Doek-Man Kang

A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.

Photoresist composition and method of manufacturing array substrate using the same

A photoresist composition is provided. The photoresist composition includes an alkali-soluble resin; a photosensitizer containing a first compound that contains a diazonaphthoquinone represented by Formula 1 and a second compound that contains a diazonaphthoquinone represented by Formula 2; and a solvent. andR1 is selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 4 carbons, an alkenyl group having 2 to 4 carbons, a cycloalkyl group having 3 to 8 carbons, and an aryl group having 6 to 12 carbons, and R2 is selected from the group consisting of Cl, F, Br, and I.

Photoresist composition and method of forming pattern by using the same

A thinner for rinsing photoresist including 50 to 80 wt. % of n-butyl acetate, propylene glycol alkyl ether, and propylene glycol alkyl ether acetate, is provided. The thinner is neither toxic to humans nor ecologically undesirable and has no unpleasant odor. The waste solutions thereof and associated waste water are easily handed so as to render this thinner environmental friendly. Additionally, the photoresist thinner of the present invention has excellent rinsing ability.

Thinner for rinsing photoresist and method of treating photoresist layer

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Pyeongtaek-si, South Korea

Sae-Tae Oh