The Furukawa Electric Co., Ltd.

Uacj Corporation

Other

Sadayuki Toda

Hisashi Koaizawa

Kotaro Kitawaki

Takuya Murata

Toshihiro Nakamura

Ryo Sakamoto

Hideyuki Hatakeyama

Makoto Yonemitsu

Naoki Kitamura

Yasuo Fujii

Hideki Takahashi

Satoshi Yamazaki

Masaru Hori

Takashi Nakayama

Masahide Kuwabara

Hiroyuki Wada

Kiyoshi Arima

Kenkichi Suzuki

Takeshi Hirayama

Akira Hibino

Imei Shu

Takashi Fuyuki

Masanobu Onishi

An aluminum alloy sheet for a magnetic disk includes an aluminum alloy comprising 0.10 to 3.00 mass % (hereafter simply '%') of Fe, 0.1 to 3.0% of Mn, 0.003 to 1.000% of Cu, and 0.005 to 1.000 s % of Zn, wherein second phase particles having a maximum diameter of 100 &#x3bc;m or more and 300 &#x3bc;m or less are dispersed at a distribution density of 50 particles/mmor less in a region (A) occupying 25% or less of a sheet thickness from a sheet thickness center plane to opposite surfaces of the sheet, second phase particles having a maximum diameter of 100 &#x3bc;m or more and 300 &#x3bc;m or less are 0 particles/mmin a region (C) that is obtained by excluding the region (A) from a region (B) occupying 50% or less of the sheet thickness from the sheet thickness center plane to the opposite surfaces of the sheet, and the amount of Mn solid solution is 0.03 mass % or more.

Aluminum alloy sheet for magnetic disk and production method therefor, and magnetic disk using said aluminum alloy sheet for magnetic disk

A magnetic disk substrate is composed of an aluminum alloy substrate, a base plating layer on a surface of the aluminum alloy substrate, and a boundary region between the aluminum alloy substrate and the base plating layer. The boundary region includes a specific boundary region (D(1)) having Al emission intensities equal to 50% to 84% of an average Al emission intensity in an interior region of the aluminum alloy substrate in glow discharge optical emission spectroscopy in the depthwise direction from the surface of the magnetic disk substrate. The specific boundary region (D(1)) has a maximum Fe emission intensity (I(1)) higher than an average Fe emission intensity (I(1)) in the interior region of the aluminum alloy substrate in the glow discharge optical emission spectroscopy.

Magnetic disk substrate, method for manufacturing same and magnetic disk

There are provided: an aluminum alloy magnetic disk substrate including: an aluminum alloy base material including an aluminum alloy containing 0.4 to 3.0 mass % (hereinafter, simply referred to as '%') of Fe, 0.1 to 3.0% of Mn, 0.005 to 1.000% of Cu, and 0.005 to 1.000% of Zn, with the balance of Al and unavoidable impurities; and an electroless Ni&#x2014;P plated layer formed on a surface of the aluminum alloy base material, in which the peak value (BLEI) of Fe emission intensity at an interface between the electroless Ni&#x2014;P plated layer and the aluminum alloy base material, as determined by a glow discharge optical emission spectrometry device, is lower than Fe emission intensity (AlEI) in the interior of the aluminum alloy base material, as determined by the glow discharge optical emission spectrometry device; and a method for producing the aluminum alloy magnetic disk substrate.

Aluminum alloy magnetic disk substrate and method for producing same

The present invention provides: an aluminum alloy substrate for magnetic discs with excellent plating surface smoothness; a manufacturing method therefor; and a magnetic disc using said aluminum alloy substrate for magnetic discs. The present invention is an aluminum alloy substrate for magnetic discs, a manufacturing method therefor, and a magnetic disc using said aluminum alloy substrate for magnetic discs, the aluminum alloy substrate being characterized in being obtained from an aluminum alloy containing Mg: 2.0-8.0 mass % ('%' below), Be: 0.00001-0.00200%, Cu: 0.003-0.150%, Zn: 0.05-0.60%, Cr: 0.010-0.300%, Si: 0.060% or less, Fe: 0.060% or less, the balance being obtained from Al and unavoidable impurities.

Aluminum alloy substrate for magnetic discs and manufacturing method therefor, as well as magnetic disc using said aluminum alloy substrate for magnetic discs

An apparatus of removing coatings of a line-shaped body of the invention includes a non-equilibrium atmospheric pressure plasma source with radicals controlled, having a plasma generating gas, a microwave, a micro gap; a line-shaped body holding portion for holding the line-shaped body within a range of 2 to 3 mm from an electrode to generate a plasma jet; and a moving stage for relatively moving the line-shaped body in the longitudinal direction thereof.

Apparatus and method of removing coating of line-shaped body using plasma

A method of continuously forming a thin film includes the step of: moving a glass substrate with a thin strip shape having a constant db/2(d+b), where d is a thickness thereof and b is a width thereof in a cross section thereof, within a range from 0.015 to 0.15 through a film depositing region in which a reaction gas is supplied and a temperature is controlled to be high so that the glass substrate is rapidly heated; and moving continuously the glass substrate, immediately after the film depositing region, to pass through a cooling region in which a temperature is lower than that of the film depositing region, so that the glass substrate is rapidly cooled and the thin film formed of a component of the reaction gas is formed on the glass substrate.

Method of forming continuous thin film and linear glass substrate with thin film

The present invention provides a SOI substrate that can realize a composite device formed of a MOS integrated circuit and a passive device and can reduce a size and a manufacturing cost of a semiconductor device. There is provided a fiber SOI substratecomprising a fiberwith a polygonal cross section, and a semiconductor thin filmcrystallized after film formation on at least one surface of the fiber, and a plurality of groovesthat extend in a linear direction of the fiberand are arranged at intervals in a width direction are formed on a surface of the fiber

Fiber SOI substrate, semiconductor device using this, and manufacturing method thereof

A sheet glass that has a side surface with an average surface roughness equal to or less than 0.2 &#x3bc;m is provided. Furthermore, a method of manufacturing a sheet glass is provided that includes processing a base-material glass sheet to obtain a sheet glass that has a side surface with an average surface roughness equal to or less than 0.2 &#x3bc;m. Moreover, a method of manufacturing a sheet glass is provided that includes processing a base-material glass sheet so that an average surface roughness of a side surface becomes equal to or less than a predetermined value according to a section modulus of the sheet glass that is to be manufactured.

Sheet glass and method for manufacturing sheet glass

An apparatus for manufacturing an optical fiber soot, which comprises a core partition having an opening portion at core burner side provided on a periphery of a core burner, in a reactor of the apparatus to be used in a conventional VAD method.

Growing community of inventors

Tokyo, Japan

Sadayuki Toda