Ulvac, Inc.

Sadatsugu Wakamatsu

Tsuyoshi Yoshimoto

Isao Tada

Takayoshi Hirono

Nobuhiro Hayashi

Kazuhiko Saito

Tomoharu Fujii

Masayuki Iijima

Yixin Yang

Nobuaki Kakutani

Naoki Sunagawa

Hiroyuki Hirano

Yoshiyuki Mitsuhashi

Togo Hosoya

Provided is a film-forming apparatus capable of cleaning a discharge apparatus under a state in which a film-forming space and a cleaning gas ambience are separated from each other while continuing to form a film on an object to be film-formed having a film-like shape. The film-forming apparatus includes a cleaning chamber configured to be connected to a film-forming space when a shutter is opened, and to be separated from the film-forming space and cause a cleaning gas to be discharged into an internal space when the shutter is closed; means for moving a discharge apparatus between a cleaning position inside the cleaning chamber and a film-forming position closer to a cylindrical member than the cleaning position; and a control apparatus that controls the discharge apparatus to discharge the raw material gas when the discharge apparatus is moved to the film-forming position, and controls the shutter to be closed so as to fill the cleaning chamber with the cleaning gas when the discharge apparatus is moved to the cleaning position.

Film-forming apparatus

Growing community of inventors

Chigasaki, Japan

Sadatsugu Wakamatsu