Ngk Insulators, Inc.

Sadanori Shimura

Tsuneaki Ohashi

Yuji Katsuda

Kiyoshi Araki

Hirotake Yamada

This invention relates to a corrosion-resistant member having a resistance to plasma of a halogen based corrosive gas, which comprises a main body and a corrosion-resistant layer formed on a surface of the main body and containing a fluoride of at least one element selected from the group consisting of rare earth elements and alkaline earth elements.

Corrosion-resistant member, wafer-supporting member, and method of manufacturing the same

To prevent an exposed surface of an anticorrosive part for an etching apparatus from being corroded, even when a highly corrosive etching gas such as a chlorine-based or fluorine-based plasma gas is used, an anticorrosive part for the etching apparatus for effecting etching treatment is provided. The anticorrosive part includes an anticorrosive part substrate, and a film of silicon carbide covering that surface of the anticorrosive part substrate which is to be exposed to an etching gas, wherein the silicon carbide film is made of polycrystals of silicon carbide having a 3C crystalline system, and (111) planes of the silicon carbide polycrystals are oriented in parallel to the surface of the silicon carbide film.

Anti-corrosive parts for etching apparatus

An aluminum nitride-based sintered body is disclosed, which includes aluminum nitride as a main ingredient and magnesium and has a polycrystalline structure composed of aluminum nitride crystals.

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Iwakura, Japan

Sadanori Shimura