Central Glass Company, Limited

Sachio Asai

Yasunobu Iida

Toshikazu Nagashima

Haruki Kuramashi

Toshiaki Itoh

Isao Nakamura

Takao Tomioka

Satoru Honda

Hidenori Noguchi

Yasunchu Iida

An ultraviolet absorbing multilayer coating formed on one side of a transparent substrate includes a first layer formed on a surface of the transparent substrate and a second layer formed on the first layer. The first layer is an ultraviolet absorbing film of a hardened primer coating of a synthetic resin which is mixed with a fluorescent brightening agent and an ultraviolet absorbing agent. The second layer is a film of a siloxane polymer. An optional infrared reflecting coating is interposed between the transparent substrate and the first layer. The ultraviolet rays until the upper limit of its wavelength can be substantially absorbed by the multilayer coating.

Glass plate with ultraviolet absorbing multilayer coating

A gray-colored heat insulating glass plate has a transparent glass plate and a multilayer coating formed on one side of the glass plate. The multilayer coating includes first, second and third layers. The first layer is formed on a surface of the glass plate, is a film of a tantalum oxide, and has a thickness ranging from 5 to 20 nm. The second layer is formed on the first layer, is a film of an oxynitride of a metal selected from Cr, Ni--Cr alloy and stainless steel, and has a thickness ranging from 5 to 25 nm. The third layer is formed on the second layer, is a film of a tantalum oxide, and has a thickness ranging from 5 to 20 nm. The heat insulating glass plate is sufficiently low in transmittance for solar radiation, sufficiently high in transmittance for radio waves, relatively low in transmittance for the visible light and good in durability.

Heat insulating glass with multilayer coating

The object of the invention is to minutely roughen a surface of a substrate, e.g. a glass plate, by an etching method for the purpose of enhancing adhesion of a coating film to the substrate surface or preventing sticking of a certain article to the substrate surface. An easily vaporizable material such as a fat or wax as a masking material is used as a masking material, and the substrate surface is scattered with numerous microscopic droplets of the masking material by exposing the substrate surface to vapor of the masking material and simultaneously to vapor of another material, e.g. water or an alcohol, which is immiscible with the masking material and serves the purpose of preventing agglomeration of droplets of the masking material on the substrate surface. After that the substrate is etched with a suitable etching fluid, and then the masking material is removed. As the result the etched surface of the substrate is scattered with numerous microscopic, islet-like land regions.

Method of minutely roughening substrate surface by etching

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Matsusaka, Japan

Sachio Asai