Hitachi, Ltd.

Hitachi Chemical Company, Ltd.

Nippon Telegraph and Telephone Public Corporation

Hitachi Maxell, Limited

Kasei Optonix, Ltd.

Saburo Nonogaki

Hajime Morishita

Shoichi Uchino

Nobuaki Hayashi

Masahiro Nishizawa

Yoshifumi Tomita

Takahiro Kohashi

Motoo Akagi

Kiyoshi Miura

Michiaki Hashimoto

Takao Iwayanagi

Toshikatsu Manabe

Yoshio Hatano

Takumi Ueno

Hiroshi Yokomizo

Osamu Sasaya

Tadao Kaneko

Makoto Tanaka

Toshiharu Matsuzawa

Masato Ito

Toshihiko Tanaka

Norio Hasegawa

Hiroshi Fukuda

Shinkichi Horigome

Toshiei Kurosaki

Hiroshi Shiraishi

Takashi Nishida

Akira Kawakami

Teruki Suzuki

Yoshio Taniguchi

Kazusuke Yamanaka

Seiki Harada

Yoichi Oba

Tsunemi Ohiwa

Atsushi Saiki

Yoshiyuki Odaka

Kenichi Yokoyama

Shuichi Wada

Shungo Sugawara

Hiroshi Yanazawa

Kikuo Douta

Susumu Ohmatoi

Masamoto Akeyama

Ryotaro Irie

Yoshifumi Tomito

Hazime Morishita

A photosensitive composition comprising a water-soluble polymer, a dichromate and at least one aromatic diazonium salt selected from aromatic diazonium sulfates, sulfonates and chromates has high sensitivity, and a pattern having high resolution can be formed therefrom with a shortened exposure time.

Photosensitive composition containing water-soluble binder and aromatic

A black matrix color picture tube has a phosphor layer and black matrix layer formed on the inner surface of the faceplate. A layer of glass having a low softening point is provided between the phosphor layer and the inner surface of the faceplate and between the black matrix layer and the inner surface of the faceplate. The softening point of the glass is below the temperature at which the tube is subjected during a frit baking step employed in the fabrication of the tube. For example, a borophosphate glass is used as the layer of glass having a low softening point.

Black matrix color picture tube

This invention relates to a process for forming a pattern using a photosensitive composition comprising a polymeric azide and a high-molecular weight copolymer or polymer. The photosensitive composition comprises a copolymer containing at least a water-soluble non-photosensitive monomeric unit having an electrolytic functional group, a monomeric unit having an azido group and an electrolytic functional group and a high-soluble high molecular weight copolymer or polymer which exhibits reciprocity law failure characteristic.

Process for forming a pattern using a photosensitive azide and a

A process for forming a pattern comprising forming an alkali-soluble polymer layer on a substrate, forming a radiation-sensitive composition layer containing a diazonium salt on the alkali-soluble polymer layer to form a resist layer having a two-layer structure, exposing the resist layer to a radiation to cause the change in solubility in an aqueous alkaline solution at the boundary between the two layers and forming a predetermined pattern in the resist layer by a usual resist process. The resist layer may comprise a plurality of layers comprising the two-layer structure as a repeating unit structure.

Radiation imaging process for forming pattern without alkali-soluble

An area on a photoresist film which is formed on a substrate surface having a topography, is exposed a plurality of times in such a manner that the image plane of a mask pattern is formed at a plurality of positions which are spaced apart from a reference plane in the substrate in the direction of an optical axis, and then the photoresist film is developed to form a resist pattern. According to the above method, the effective focal depth of the projection aligner used is enhanced, and moreover the reduction of the image contrast at the photoresist film is made very small by the plural exposure operations. Accordingly, a fine pattern can be formed accurately on the substrate surface having the topography.

Method of forming pattern and projection aligner for carrying out the

An optical contact of a patternwise powdery coating layer is improved by permeating a substantially transparent inorganic material having a refractive index of 1.2 to 2.0 into a paternwise powdery coating layer formed on a substrate, thereby forming a mixture layer of the transparent inorganic material and the powdery coating layer between the patternwise powdery coating layer and the substrate.

Process of improving optical contact of patternwise powdery coating

A high contrast and brightness fluorescent screen of a color picture tube has a light absorbing layer in the form of fine dots or stripes provided for the inner surface of a panel of the tube on which the phosphor layer is formed, and a light reflection layer provided at an interface between the light absorbing layer and the phosphor layer. To manufacture the fluorescent screen, a photosensitive resin layer coated on an inner surface of the panel is exposed to light through a photomask mounted on outside of the panel to form a pattern. Nonluminous light absorbing substance is applied on the pattern to form the light absorbing layers.

Fluorescent screens of color picture tubes and manufacturing method

A light-transmitting layer is formed on a transparent glass panel, the light-transmitting layer having a larger refractive index than that of the glass panel, and a light-absorbing layer having a light-transmitting region is formed on the light-transmitting layer. The light reflected from the interface of the glass panel and the light-absorbing layer is effectively attenuated by the light-transmitting layer, so that it is possible to obtain an excellent image having a considerably strong contrast.

Face plate for display

An electrochromic display device which comprises a display electrode comprising a transparent substrate, a transparent electrode formed on an inner surface of the transparent substrate and an electrochromic material layer for display made of tungsten oxide and formed on the transparent electrode; a counter electrode comprising a substrate, a conductive layer formed on an inner surface of the substrate and an activated carbon fiber material; and a spacer provided between the display electrode and the counter electrode with their inner surfaces facing each other to define, between them, an electrolyte chamber, which is filled with an electrolyte comprising a lithium salt and at least one of the tertiary alkyl ammonium salts and quarternary alkyl ammonium slats dissolved in a non-aqueous medium containing a small amount of water, which device has increased original injected charge which can last for a long time.

Electrochromic display device

A photosensitive composition comprising (1) at least one diazonium compound selected from among salts and double salts of diazonium ions represented by the general formulas: ##STR1## wherein A stands for a substituent selected from among ##STR2## wherein R.sub.1 and R.sub.2 each stand for an alkyl or benzyl group with the proviso that the total number of carbon atoms of R.sub.1 and R.sub.2 is 8 to 16, and (2) at least one nitrate selected from the group consisting of calcium nitrate and magnesium nitrate and a pattern forming process using such a composition. This composition gets sticky upon exposure to light.

Photosensitive composition and pattern forming process using same

A photosensitive composition comprising an azide compound represented by the formula: ##STR1## wherein each of X and Y is an aromatic substituent group, at least one of X and Y being an aromatic substituent group having an azide group, and n and m are zeros or integers of 1, and a polymeric compound. Since this composition has high resolution and is photosensitive to light having a wavelength of 436 nm, it permits employment of a reduction projection printer and is suitable for fabrication of semiconductor devices.

Photosensitive composition with azide or bisazide compound with

A film of a photoresist having phenolic hydroxyl groups is irradiated with far-ultraviolet radiation, and is thereafter developed with an alkaline aqueous solution. Using as a mask a resist pattern thus obtained, dry etching is carried out to form a microscopic pattern. Since the photoresist is highly immune against the dry etching, the microscopic pattern can be formed at a high precision. By adding an azide of a specified structure, the photoresist has its sensitivity to the far-ultraviolet radiation enhanced more.

Method of forming a microscopic pattern with far UV pattern exposure,

A photosensitive composition comprising an equimolar condensation product of an aromatic azide compound having an aldehyde group and isophorone, and an alkali-soluble polymeric compound is a negative-type photoresist with a high resolution suitable for the fabrication of semiconductor devices.

Photosensitive azide composition with alkali soluble polymer and process

A process for forming a pattern on the interior side of a face plate of a color picture tube by using a photosensitive composition comprising p-diazo-N,N-dimethylaniline chloride-zinc chloride double salt and a p-diazo-bromophenol chloride-zinc chloride double salt and conducting imagewise exposure of coated film of the photosensitive composition to light and contacting with powder particles at least one time gives higher sensitivity compared with a conventional process.

Process for forming pattern

A water-soluble, positive-working photoresist composition is disclosed which comprises water-soluble aromatic diazonium salt, water-soluble phenolic compound, and water-soluble polymeric compound. When the film of this composition is irradiated with a pattern of actinic ray and then brought into contact with an alkaline gas or solution, the coating of unexposed areas hardens to become water-insoluble. Preferably, when the film is brought into contact with a suspension of powder or dry powder after being hardened, a positive pattern of powder is obtained by the development with water.

Process of forming powder pattern using positive diazonium salt

Growing community of inventors

Tokyo, Japan

Saburo Nonogaki