Fraunhofer-gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Sabrina Wolleb

Peter Munzert

Ulrike Schulz

Friedrich Rickelt

Heiko Knopf

A method for producing a reflection-reducing layer system is disclosed. In an embodiment, a method includes depositing an organic layer on the substrate, generating a nanostructure in the organic layer by a plasma etching process, applying a cover layer to the nanostructure, wherein the organic layer, the nanostructure and the cover layer together form a reflection-reducing structure, wherein the cover layer comprises an inorganic material or an organosilicon compound, and wherein the cover layer is at least 5 nm thick and performing a post-treatment after applying the cover layer, wherein a material of the organic layer is at least partially removed, decomposed or chemically converted, and wherein an effective refractive index nof the reflection-reducing structure after the post-treatment is smaller than an effective refractive index nof the reflection-reducing structure before the post-treatment.

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Jena, Germany

Sabrina Wolleb