Jsr Corporation

Tri Chemical Laboratories Inc.

Ryuuichi Saitou

Tatsuya Sakai

Hideki Nishimura

Masahiro Yamamoto

Hisashi Nakagawa

Tsuyoshi Furukawa

Kang-go Chung

Sanshiro Komiya

Naoto Noda

Maki Nishiguchi

Hideyuki Aoki

Provided is a method for producing a substrate with a metal body. This method provides excellent film-forming properties (reflectance and adhesion), is easy to be used on a large substrate, and can be carried out at a low cost. The method includes the steps of: (A) heating a complex to a first temperature so as to generate a vapor of the complex; and (B) contacting the vapor with a substrate heated to a second temperature that is not higher than the first temperature so as to form a metal body containing a central metal of the complex, either in uncombined form or as a compound thereof (exclusive of the complex), on at least part of a surface of the substrate. The second temperature in step (B) is lower than the decomposition temperature of the complex. The central metal of the complex is aluminum or titanium.

Method for producing substrate with metal body

A method for producing ruthenium compound including the step of reacting a compound represented by General Formula (1): RuL(wherein Lrepresents an unsaturated hydrocarbon compound having 4 to 10 carbon atoms and at least two double bonds) with trifluorophosphine or reacting the compound represented by General Formula (1) with trifluorophosphine, and hydrogen or a halogen to obtain a compound represented by General Formula (2): Ru(PF)(L)(L)(wherein Lrepresents a hydrogen atom or halogen atom, Lrepresents an unsaturated hydrocarbon compound having 4 to 10 carbon atoms and at least two double bonds, l is an integer from 1 to 5, m is an integer from 0 to 4, and n is an integer from 0 to 2, provided that l+m+2n=5 or 6). With this method, a trifluorophosphine-ruthenium compound can be synthesized under low-temperature and low-pressure conditions.

Method for producing ruthenium compound

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Tokyo, Japan

Ryuuichi Saitou