Ngk Insulators, Inc.

Ryujiro Nagasaka

Shinji Nakamura

Makoto Miyahara

Hideyuki Suzuki

Makiko Ichikawa

Akimasa Ichikawa

Kenji Yajima

Tatsuya Hishiki

Ichiro Wada

A zeolite membrane structure includes a porous support, and a zeolite membrane. The zeolite membrane has a first zeolite layer located in a surface of the porous support, and a second zeolite layer located outside of the surface of the porous support and integrally formed with the first zeolite layer. The porous support has an outermost layer in which the first zeolite layer is located. An average thickness of the first zeolite layer is less than or equal to 5.4 micrometers. A porosity of the outermost layer is greater than or equal to 20% and less than or equal to 60%.

Zeolite membrane structure

A zeolite membrane structure includes a porous support, and a zeolite membrane. The zeolite membrane has a first zeolite layer located in a surface of the porous support, and a second zeolite layer located outside of the surface of the porous support and integrally formed with the first zeolite layer. The porous support has an outermost layer in which the first zeolite layer is located. An average thickness of the first zeolite layer is less than or equal to 5.4 micrometers. An average pore diameter of the outermost layer is greater than or equal to 0.050 micrometers and less than or equal to 0.150 micrometers.

Zeolite membrane structure and method for producing same

A method of manufacturing a separation membrane structure comprising a step of forming a first to nzeolite membranes on a surface of a porous substrate by 'n' repetitions (wherein n is an integer greater than or equal to 2) of formation of a zeolite membrane by a method of hydrothermal synthesis. The following formula (1) is established in relation to the step of forming the first to the nzeolite membranes. (Formula 1) N/N+0.1&#x2264;T/T&#x2264;2N/N+2 (Wherein, Ndenotes a permeation rate of a predetermined gas in the substrate after formation of the first zeolite membrane, Ndenotes a permeation rate of a predetermined gas in the substrate before formation of the first zeolite membrane, Tis a time required for formation of the first zeolite membrane, and Tis a total time required for formation of the second to the nzeolite membranes.)

Method of manufacture of separation membrane structure

Each cell is pressurized with gas from outside of the cell, the amount of permeation of the gas permeated into each cell is measured, and a cell having the amount of permeation greater than (average value of all cells+A) (wherein A is a predetermined value of &#x3c3; to 6&#x3c3;, where &#x3c3; is the standard deviation) is considered to be defective. Alternatively, pressure is reduced for each cell, the degree of vacuum in each cell is measured, and a cell having the degree of vacuum worse than (average value of all cells+A) is considered to be defective. Then, a polymer compound is poured into the defective cells of the monolithic separation membrane structure and cured so that the defective cells are sealed. Alternatively, the polymer compound formed in advance as the sealing member is inserted into the defective cells to seal the defective cells.

Defect detection method for monolithic separation membrane structures, repair method, and monolithic separation membrane structures

A simple method of manufacturing a silica membrane which has high separation performance and high permeation flux is provided. The method is a method for manufacturing a silica membrane by depositing a silica sol on a porous substrate, drying the silica sol by air blowing which has a dew point of -70 to 0&#xb0; C., and then firing the same thereafter to produce the silica membrane. Further, the silica sol is preferably dried by air blowing at an air velocity of 5 to 20 m/sec.

Method of manufacturing silica membrane

Provided is a simple method for regenerating a zeolite membrane which has been exposed to water. The method for regenerating a zeolite membrane is a method for regenerating a zeolite membrane which is formed on a ceramic porous body and subjected to removal treatment of structure directing agent. Heating is performed at a regeneration temperature at which the difference in ratio of thermal expansion amount between the ceramic porous body and the zeolite membrane is 0.3% or less when 40&#xb0; C. is set as datum. The regeneration temperature is preferably a temperature not exceeding the oxidative pyrolysis temperature of the structure directing agent used in the formation of the zeolite membrane.

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Nagoya, Japan

Ryujiro Nagasaka