Kabushiki Kaisha Toshiba

Ryuji Tada

Atsushi Sugahara

Osamu Shimada

Katsuhiko Inada

Masahiro Seiki

Tadashi Ejiri

Kouichi Shiba

A method for manufacturing an electrode substrate includes providing an insulating substrate and forming a first conductive layer on the insulating substrate. The first conductive layer has a narrowed wiring region and forms a first wiring pattern and a second wiring pattern. The narrowed wiring region defines a boundary region disposed between the first wiring pattern and the second wiring pattern. The method also includes forming a second conductive layer in electrical contact with the first conductive layer. The second conductive layer has a narrowed wiring region and forms a third wiring pattern and a fourth wiring pattern. The narrowed wiring region of the second conductive layer defines another boundary region disposed between the third wiring pattern and the second wiring pattern. The first and second conductive layers are formed such that the boundary regions of each of the first and second conductive layers do not overlap each other.

Method of manufacturing an electrode substrate resistant to wire breakage for an active matrix display device

An electrode substrate comprising a first conductive layer having a narrowed wiring region, defining a boundary region, separating a first wiring pattern and a second wiring pattern of the first conductive layer. The electrode substrate further comprises a second conductive layer in electrical contact with the first conductive layer, the second conductive layer having a narrowed wiring region, defining another boundary region, separating a third wiring pattern and a fourth wiring pattern of the second conductive layer. The boundary region of the first conductive layer and the boundary region of the second conductive layer do not overlap each other

Electrode substrate resistant to wire breakage for an active matrix display device

An object of the technology of our invention is to solve a luminance defect viewed as a 'seam' or the like and to provide a liquid crystal display device having a screen for equally displaying an image. For example, when an exposing process is performed for one conductor layer or a dielectric layer, a total of four photomasks are used corresponding to four shot areas. A light insulation layer of a photomask used for the exposing process for patterning for example a signal line is formed so that it becomes a projection pattern of the signal line. The photomasks corresponding to adjacent shot areas are formed so that patterns of the light insulation layers of the boundary portion are engaged with each other on the plane.

Display device in which display regions have non-linear boundaries and

The present invention is to provide an LCD panel in which the effective display area is great relative to the outside dimension. The LCD panel comprises an array substrate, a counter substrate and a light modulating layer obtained by injecting liquid crystal into the gap between these substrates. The array substrate includes a display area and a seal region formed around the display area. The display area includes data lines, scanning lines, switching devices controlled by the scanning lines and pixel electrodes connected to the data lines. The seal region includes a first wiring line constituted by a plurality of narrow lines and arranged along the seal line. The counter substrate has a counter electrode and is arranged opposite to the array substrate with a gap therebetween. The counter substrate is adhered to the array substrate in the seal region. A voltage is supplied to the counter electrode through the first wiring line.

Growing community of inventors

Hyogo-ken, Japan

Ryuji Tada