Rigaku Corporation

Ryuji Matsuo

Tetsuya Ozawa

Kazuhiko Omote

Katsuhiko Inaba

Go Fujinawa

Akira Echizenya

Tetsuo Kikuchi

Licai Jiang

Boris Verman

Yoshinori Ueji

Ryouichi Yokoyama

Kamihisa Endo

Takuya Kikuchi

Susumu Yamaguchi

Makoto Aoyagi

A correction amount specifying apparatus comprises circuitry for storing diffraction data including a combination of the diffraction angle of the irradiation X-rays with respect to the sample rotation angle and the sample surface height, the diffraction data being acquired by irradiating X-rays to a standard sample that is an aggregate of isotropic and stress free crystal particles, determining a first correspondence relationship based on the diffraction data, and specifying a correction amount of the sample surface height with respect to a desired sample rotation angle and a desired diffraction angle based on the first correspondence relationship.

Correction amount specifying apparatus, method, program, and jig

An X-ray apparatus that creates a virtual source having a narrow energy bandwidth and enables a high-resolution X-ray diffraction measurement; a method of using the same; and an X-ray irradiation method are provided. An X-ray apparatusincludes a monochromatorthat focuses a divergent X-ray beam while dispersing it and a selection partthat is installed in a condensing position of the condensed X-ray beam for selecting an X-ray beam having a wavelength in a specific range, allowing it to pass through, and creating a virtual source. With this arrangement, it is possible to create a virtual source having a narrow energy bandwidth at a focal pointand by means of the virtual source a high-resolution X-ray diffraction measurement is available. By using the X-ray apparatus, it is possible to sufficiently separate an X-ray beam having such an extremely narrow energy bandwidth as, for example, K&#x3b1;1 ray from K&#x3b1;2 ray. In addition, it is also possible to cut out part of continuous X-ray beams to create a virtual source.

X-ray apparatus, method of using the same and X-ray irradiation method

Provided is an X-ray topography apparatus capable of separating a desired characteristic X-ray which enters a sample from an X-ray which is radiated from an X-ray source, and increasing an irradiation region of the desired characteristic X-ray. The X-ray topography apparatus includes: the X-ray source for radiating the X-ray from a fine focal point, the X-ray containing a predetermined characteristic X-ray; an optical system including a multilayer mirror with a graded multilayer spacing which corresponds to the predetermined characteristic X-ray, the optical system being configured to cause the X-ray reflected on the multilayer mirror to enter the sample; and an X-ray detector for detecting a diffracted X-ray. The multilayer mirror includes a curved reflective surface having a parabolic cross section, and the fine focal point of the X-ray source is provided onto a focal point of the curved reflective surface.

X-ray topography apparatus

There is provided an X-ray diffraction apparatus comprising an X-ray topography device for providing a spatial geometric correspondence to an X-ray exiting from a planar region of a sample to detect the X-ray as a planar X-ray topograph, and outputting the X-ray topograph as a signal; a two-dimensional imaging device for receiving a light-image of the planar region of the sample and outputting the light-image as a signal specified by planar positional information; and a video-synthesizing arithmetic control device for generating synthesized video data on the basis of an output signal from the X-ray topograph and an output signal from the imaging device.

X-ray diffraction apparatus and X-ray diffraction measurement method

An X-ray diffraction measuring apparatus equipped with Debye-Scherrer optical system therein, comprises a generator for generating a characteristic X-ray to be irradiated upon a sample to be measured; an X-ray detector being disposed to surround that sample around; and a focusing arrangement, being disposed between the sample and the X-ray detector, for collecting an X-ray scattering from the sample covering over a predetermined angle, in a peripheral direction, around the sample, and for focusing and irradiating it upon the X-ray detector.

X-ray diffraction measuring apparatus having debye-scherrer optical system therein, and an X-ray diffraction measuring method for the same

An X-ray beam conditioning device that has a crystal holder and a motor is provided. The crystal holder supports a first crystal block and a second crystal block, each of which diffracts X-ray by a specific diffraction angle. The motor can rotate the crystal holder around an axis extending at right angles to a plane including an optical axis of X-ray and can fixedly support the crystal holder at the rotated position. The crystal holder holds the first and second crystal blocks at such angles to each other such that both crystal blocks diffract X-ray. The optical axes of the two crystal blocks can be adjusted by rotating the crystal holder about the axis, that is, the only one axis.

X-ray beam conditioning device and X-ray analysis apparatus

An X-ray optical system provides selectively a linear X-ray beam and a point X-ray beam while using an X-ray source which generates an X-ray beam having a linear section. When the point X-ray beam is selected, an X-ray intensity per unit area becomes higher. The X-ray optical system has an X-ray source, a parabolic multilayer mirror to which an aperture slit plate is attached, an optical-path selection slit device, a polycapillary optics and an exit-width restriction slit. The polycapillary optics and the exit-width restriction slit are detachably inserted into a path of a parallel beam coming from the parabolic multilayer mirror, and thus they can be removed from the path and a Soller slit and a divergence slit can be inserted instead.

X-ray optical system

Reciprocal-space mapping measurement of X-ray diffraction requires setting of the measuring range of 2&#x3b8;/&#x3c9; and setting of the measuring range of &#x3c9;. When the measuring range of &#x3c9; is designated in absolute angle, the absolute-angle-designated range is converted into a relative-angle-designated range to be acquired; preventing setting of a warped measuring region. When the measuring range of &#x3c9; is designated in relative angle, it is acquired as it is. For the measuring range of 2&#x3b8;/&#x3c9;, any one of the absolute-angle-designated range and the relative-angle-designated range may be acquired.

Method of setting measuring range of reciprocal-space mapping

A method for measuring a pole of a sample, using a reflection method, is effective substantially over all measurement regions ranging from the region of high-tilting-angle &#x3b1; of a conventional pole measuring to the in-plane diffraction region corresponding to low-tilting-angle &#x3b1;.

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Hino, Japan

Ryuji Matsuo