Tokuyama Corporation

Sun-tox Co., Ltd.

Ryuji Ishimoto

Masao Ariyuki

Yoji Inui

Isao Masada

Shota Daiki

Hideki Umekawa

Naoto Mochizuki

Masahiro Nakamura

Hironori Honda

Yoshihiro Kimura

Yasuhiro Nagatani

A hexagonal boron nitride powder whose maximum absorption peak within the range of 3,100 to 3,800 cmof the diffuse reflectance fourier transform infrared spectrum is existent at 3,530 to 3,590 cmand which is able to provide high heat conductivity, dielectric strength and copper foil peel strength to a resin composition obtained by filling the powder into a resin, and a process for producing the above boron nitride powder by mixing together an oxygen-containing boron compound, a carbon source having a sulfur concentration of 1,000 to 10,000 ppm and an oxygen-containing calcium compound in a specific ratio and reduction nitriding the mixture.

Hexagonal boron nitride powder and production process therefor

To reduce scratches during polishing while ensuring an appropriately high polishing rate, provided are a silica for CMP satisfying the following (A) to (C), an aqueous dispersion using a silica for CMP, and a method of producing a silica for CMP: (A) a BET specific surface area of 40 m/g or more and 180 m/g or less; (B) a particle density measured by a He-gas pycnometer method of 2.24 g/cmor more; and (C) a coefficient of variation in primary particle diameter calculated by TEM/image analysis of 0.40 or less.

Silica for CMP, aqueous dispersion, and process for producing silica for CMP

There is provided particulate silica which can be suitably used as a viscoelasticity modifier such as a thickener which is added to liquid such as water, a liquid resin or paint to adjust its viscoelastic properties such as viscosity and thixotropic nature, a reinforcer or filler for silicone rubber or sealants, a polishing agent for CMP (Chemical Mechanical Polishing) or a surface coating agent for ink-jet printing paper. The particulate silica has a BET specific surface area S of 130 to 380 m/g, and its fractal shape parameter &#x3b1;in an &#x3b1;-value analysis target range of 20 to 30 nm satisfies the following equation (1) and its fractal shape parameter &#x3b1;in an &#x3b1;-value analysis target range of 30 to 50 nm satisfies the following equation (2).&#x3b1;1+0.00175&#x3c;2.518&#x2003;&#x2003;(1)&#x3b1;2+0.00174&#x3c;2.105&#x2003;&#x2003;(2)

Particulate silica

Provided are a gas-barrier film which is a laminate comprising a substrate layer comprising a thermoplastic resin film and a gas-barrier layer comprising a hydrolysate of a silicon alkoxide, a stratified silicate and a polyvinyl alcohol base resin, wherein a radius (Rg) of gyration of a scattering matter which is measured by light scattering in the gas-barrier layer described above is 2.4 &#x3bc;m or less, and the silicon alkoxide and/or the hydrolysate thereof are present between the layers of the stratified silicate present in the above gas-barrier layer. The above film shows an excellent gas-barrier property even under such a high humidity as exceeding 90% RH.

Gas-barrier film and gas-barrier coating agent, and method for production thereof

Growing community of inventors

Shunan, Japan

Ryuji Ishimoto