Nec Corporation

Kao Corporation

Ryuji Hasegawa

Hideyuki Moribe

Takahiro Igeta

Yoshikazu Katou

Keiichi Fukuda

Noboru Nagatani

Hideaki Kubo

Naoki Nojiri

Yuko Yago

Hidetake Nakamura

Keisuke Nakao

A resist inspection apparatus is provided which has a configuration in which a reticle is separated from a pellicle. A reticle cassette is made up of two pieces of plate members. A hollowed portion with a shape allowing the reticle to be inserted into the plate member. Another hollowed portion having a shape being slightly larger than that of the resist of the reticle is formed on the plate member. In the circumference of the hollowed portion is placed a pellicle frame on which a protective film is formed in a stretched manner. In the concave portion is housed in the reticle with a resist on the reticle directed toward the hollowed portion. The reticle is put in sealed space.

Photomask mounting/housing device and resist inspection method and resist inspection apparatus using same

A cosmetic composition having excellent application feeling and transparency while maintaining covering power which includes (a) composite particles obtained by allowing at least two kinds of particles having different shapes and particle diameters to contact with at least one polymer compound selected from the group consisting of fluorinated polymer compounds, silicone polymer compounds, and mixture thereof, in the presence of supercritical carbon dioxide, and (b) a cosmetic component.

Cosmetic composition

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Tokyo, Japan

Ryuji Hasegawa