Jsr Corporation

Ryuichi Serizawa

Nobuji Matsumura

Hiroshi Tomioka

Yukio Nishimura

Hirokazu Sakakibara

Kazunori Sakai

Akimasa Soyano

Noboru Otsuka

Kengo Hirasawa

Yuusuke Ootsubo

A composition includes: a metal compound including a ligand; and a solvent. The ligand is derived from a compound represented by formula (1). L represents an oxygen atom or a single bond; Rrepresents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; Rand Reach independently represent a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms, or Rand Rbind with each other and represent an alicyclic structure having 3 to 20 ring atoms together with the carbon atom to which Rand Rbond, or Rand either Ror Rbind with each other and represent a lactone ring structure having 4 to 20 ring atoms or a cyclic ketone structure having 4 to 20 ring atoms together with the atom chain to which Rand either Ror Rbond.

Composition, film, method of forming film, method of forming pattern, method of forming organic-underlayer-film reverse pattern, and method of producing composition

A silicon-containing composition includes a polysiloxane compound and solvent. The polysiloxane compound includes a fluorine atom and a group including an ester bond. The polysiloxane compound preferably includes a first structural unit represented by formula (1), and a second structural unit represented by formula (2). X represents a monovalent organic group having 1 to 20 carbon atoms and comprising a fluorine atom; Rrepresents a halogen atom, a hydroxy group, or a monovalent organic group having 1 to 20 carbon atoms; Y represents a monovalent organic group having 1 to 20 carbon atoms and comprising an ester bond; and Rrepresents a halogen atom, a hydroxy group, or a monovalent organic group having 1 to 20 carbon atoms.

Silicon-containing composition and method of producing semiconductor substrate

A radiation-sensitive resin composition includes an acid-labile group-containing resin, and a compound shown by the following general formula (i). Rrepresents a hydrogen atom or the like, Rrepresents a single bond or the like, Rrepresents a linear or branched unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms or the like, and Xrepresents an onium cation. 

Radiation-sensitive resin composition

A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). Xis an onium cation. Xin the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof. 

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Tokyo, Japan

Ryuichi Serizawa