Jsr Corporation

Ryuichi Serizawa

Nobuji Matsumura

Hiroshi Tomioka

Yukio Nishimura

Hirokazu Sakakibara

Akimasa Soyano

Noboru Otsuka

Kengo Hirasawa

A silicon-containing composition includes a polysiloxane compound and solvent. The polysiloxane compound includes a fluorine atom and a group including an ester bond. The polysiloxane compound preferably includes a first structural unit represented by formula (1), and a second structural unit represented by formula (2). X represents a monovalent organic group having 1 to 20 carbon atoms and comprising a fluorine atom; Rrepresents a halogen atom, a hydroxy group, or a monovalent organic group having 1 to 20 carbon atoms; Y represents a monovalent organic group having 1 to 20 carbon atoms and comprising an ester bond; and Rrepresents a halogen atom, a hydroxy group, or a monovalent organic group having 1 to 20 carbon atoms.

Silicon-containing composition and method of producing semiconductor substrate

A radiation-sensitive resin composition includes an acid-labile group-containing resin, and a compound shown by the following general formula (i). Rrepresents a hydrogen atom or the like, Rrepresents a single bond or the like, Rrepresents a linear or branched unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms or the like, and Xrepresents an onium cation. 

Radiation-sensitive resin composition

A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). Xis an onium cation. Xin the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof. 

Radiation-sensitive resin composition, polymer, and compound

Growing community of inventors

Tokyo, Japan

Ryuichi Serizawa