Tokyo Electron Limited

Ryouga Kamo

Nobuhiro Ogata

Yoshihiro Kai

Yoshinori Ikeda

Terufumi Wakiyama

Disclosed are a liquid processing apparatus and a cleaning method which may perform cleaning on a portion which is not in the vicinity of a drain section in an exhaust route. The liquid processing apparatus includes an exhaust section provided in vicinity of the drain section, which is configured to exhaust a surrounding atmosphere of the substrate held by the substrate holding unit; an exhaust route forming member configured to form an exhaust route reaching the exhaust section; and a first cleaning unit configured to supply a cleaning liquid to the exhaust route forming member at the exhaust route side.

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Kumamoto, Japan

Ryouga Kamo