Denso Corporation

Ryosuke Okachi

Katsuhiro Kutsuki

Junya Muramatsu

Masataka Deguchi

Keita Kataoka

Isao Aoyagi

Takashi Tominaga

Takashi Kohyama

A state determination device includes an initial waveform storage unit, a waveform acquisition unit, an element temperature acquisition unit, a past waveform storage unit, and a failure state determination unit. The failure state determination unit classifies the time waveform based on the initial time waveform of the gate voltage, the current time waveform of the gate voltage, the element temperature, and the past time waveform of the gate voltage, and determines a fault condition of the IGBT.

State determination device and vehicle

Main cells that constitute a semiconductor element having a trench gate structure include first cells, and second cells having a structure in which gate insulating films are more easily broken by energization than those in the first cells, and the number of which is smaller than that of the first cells. At a time of driving the semiconductor element, a common gate drive voltage is applied to gate electrodes of the first cells and the second cells. An electrical characteristic is measured to detect failure of the second cells due to energization at the time of driving. The gate electrodes of the failed second cells are electrically isolated from the gate electrodes of the first cells so that the gate drive voltage is not applied to the failed second cells. The failure of the first cells is predicted based on the failure of the second cells.

Method for predicting failure of semiconductor device, and semiconductor device

Growing community of inventors

Nagakute, Japan

Ryosuke Okachi