Kyosan Electric Mfg. Co., Ltd.

Ryosuke Ohma

Itsuo Yuzurihara

Hiroshi Kunitama

Yu Hosoyamada

Satoshi Aikawa

Takeshi Fujiwara

Satoshi Kawai

Ryota Suzuki

Provided is multi-phase interleaving control in a power supply device, the control allowing the pulse widths &#x394;T of respective phases to overlap one another, so as to be adaptable to wideband pulse power control. In applying dead beat control to the multi-phase interleaving, constant current control is performed using combined current of the respective phase current values, and the pulse widths &#x394;T(k) is computed under this constant current control, thereby preventing variation of the pulse widths &#x394;T(k) between the phases, and achieving stable power control. Accordingly, the pulse power control becomes adaptable to wideband. Furthermore, wideband control is possible also in two-level pulse power control that performs control by switching at high frequency between High-level power and Low-level power.

Power supply device and method for controlling power supply device

To suppress a leakage current flowing through a parasitic capacitor of an insulated transformer of a high-side insulated power. The present invention suppresses a common mode current using a common mode reactor by focusing on the fact that a leakage current flowing through a parasitic capacitor of an insulated transformer of a high-side insulated power source resulting from a high-frequency signal generated due to an on/off operation of a high-side switching element is the common mode current. The common mode reactor reduces the common mode current and bears the high-frequency signal to prevent the high-frequency signal from being applied to the insulated transformer of the high-side insulated power source, suppress the leakage current flowing through the parasitic capacitor of the insulated transformer, and reduce an erroneous operation of the high-side switching element generated due to the leakage current flowing through the parasitic capacitor of the insulated transformer.

Insulated power source and power conversion device

Provided is multi-phase interleaving control in a power supply device. In power control by the power supply device where the dead beat control is applied to the multi-phase interleaving, combined current of the multi-phase current values is used as control current in the multi-phase control based on the multi-phase interleaving, thereby achieving control independent of the number of the detectors and the control system independent of the number of phases, and further, this control current is used to perform constant current control, so as to prevent overshooting and undershooting. The power supply device has multi-phase interleaving control that performs multi-phase control using a plurality of phase current values, provided with an LC chopper circuit constituting a step-down chopper circuit that operates according to the multi-phase control of multi-phase interleaving, and a controller for performing step response control according to the multi-phase control of the LC chopper circuit.

Multi-phase interleaving control in a power supply device is accelerated. In addition, in accelerating the multi-phase interleaving control in the power supply device, acceleration in detecting a feedback signal and stabilization of a control system in a high-frequency band are promoted. Eliminating the need of the feedback signal according to a slow response detector, and using a detection signal obtained by a detector for detecting an AC signal capable of rapid response, thereby accelerating the multi-phase interleaving control in the power supply device. Then, the control system is stabilized, by satisfying a condition where gain is equal to 1 or less in a transfer function of the control system including an LC circuit, and a condition where a phase shift caused by dead time of switching time does not affect the sampling cycle.

Power supply device and method for controlling the multi-phase interleaving operation of the power supply device

Multi-phase interleaving control of a power supply device is accelerated. Furthermore, in accelerating the multi-phase interleaving control in the power supply device, detection of feedback signal is accelerated. In the power supply device and a method for controlling the power supply device, output voltage is acquired as an operation result of a discrete time process using an initial value of the output voltage at a predetermined point, and a detection value of capacitance current at each point of the discrete time process. Accordingly, only detection of the initial value is performed when the output voltage being slow in response is acquired, and detection performed in the discrete time process can be accomplished by detection of capacitance current being rapid in response, thus enabling rapid response.

A chopper section of a power supply device includes a plurality of step-down chopper circuits, and multiphase control of the step-down chopper circuits is performed using gate signals having phases displaced from each other. This shortens the period with which output signals of the step-down chopper circuits are changed. Shortening the period reduces the amount of jitter resulting from a gap between the occurrence of a command signal and a sampling point that is a point in time at which a gate signal is generated. The number of phases of the gate signals equals the number of phases of the step-down chopper circuits. The control of the gate signal generator is asynchronous to feedback control by the controller. Points in time (sampling points) at which gate signals are generated are points in time of generation (sampling points) after a point in time at which the controller calculates a manipulated value.

In frequency control where impedance matching is performed by frequency sweep in an RF power supply device, a frequency sweep direction is specified, allowing a reflection coefficient and/or reflected power to move to a minimum, whereby it is possible to reduce a time length required until detecting the frequency that enables the reflection coefficient and/or the reflected power to be minimized. The frequency control for impedance matching in the RF power supply device is performed according to the following two-stage control; A) phase control that specifies the frequency sweep direction that allows the reflection coefficient and/or the reflected power to move to a minimum, based on the phase state of oscillating frequency, and that starts increasing or decreasing the frequency in thus specified sweep direction; and B) reflected power control where the reflection coefficient or the reflection amount is used as a control end condition for completing the frequency control.

High-frequency power supply device, and control method for high-frequency power supply device

An excessive voltage rise of load voltage, caused by an impedance mismatching on a transmission path, is prevented, and high-frequency power is regenerated. A parallel impedance is connected to the transmission path during the voltage rise, thereby regenerating voltage caused by a standing wave and preventing excessive load voltage, together with enhancing energy usage efficiency. Establishing the parallel impedance for the load impedance, on the transmission path between the high-frequency amplifier circuit of the high-frequency power supply device and the high-frequency load, reduces impedance at the connecting position to prevent generation of excessive voltage on the transmission path, and high-frequency power is regenerated from the transmission path by the parallel impedance.

Regeneration circulator, high-frequency power supply device, and high-frequency power regeneration method

In detecting the unignited state of plasma based on a reflected wave, false detection during a normal plasma ignition time is prevented so as to detect the unignited state during plasma abnormality. When a pulse output is supplied to a plasma load by pulse driving from an RF power source, the unignited state of plasma abnormality is detected on the basis of the continuous state of the reflected wave, whereby a total reflected wave generated in the unignited state during plasma abnormality is detected in distinction from the reflected wave generated in the normal ignited state. With this configuration, in detecting the unignited state by comparing a peak value of the reflected wave with a threshold, it is possible to prevent that a reflected wave generated in the normal ignited state is erroneously detected as the total reflected wave that is generated in the abnormal unignited state.

Unignited plasma state discrimination device and unignited plasma state discrimination method

In a class-D amplifier, oscillation phenomenon is suppressed in a high RF range and surge voltage is reduced. An oscillation absorption circuit is connected on the power supply side of the class-D amplifier circuit, and the class-D amplifier circuit and thus connected oscillation absorption circuit equivalently configure an oscillation circuit. Resistance provided in the oscillation absorption circuit is assumed as damping resistance of the oscillation circuit, thereby suppressing the oscillation phenomenon and reducing the surge voltage. The oscillation absorption circuit is made up of the RL parallel circuit of resistance and inductance. The oscillation absorption circuit and the class-D amplifier circuit constitute the oscillation circuit, and the resistance of the oscillation absorption circuit constitutes the damping resistance of the oscillation circuit in the high RF range.

Class-D amplifier

A high-frequency power supply device is provided with a plasma ignition step that supplies pulse power to ignite plasma, and drive power supply step to supply drive power for maintaining the plasma being generated. In the plasma ignition step, an ignition pulse being applied in an ignition pulse output operation is configured as including a main pulse that induces ignition, and a prepulse with lower power than the power of the main pulse and being applied at a stage prior to the main pulse. Since the ignition pulse is configured as including the main pulse and the prepulse, this enables protection of a high-frequency power source against reflected wave power, as well as reliably igniting the plasma.

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Yokohama, Japan

Ryosuke Ohma