Canon Kabushiki Kaisha

Ryosuke Hamamoto

Masahide Hirai

Tomomi Funayoshi

In order to realize an imprint method capable of reducing a drawback caused by protrusion of an imprint material, the imprint method includes a first pattern forming process of bringing a mold into contact with an imprint material on a first pattern forming region on a substrate; a first exposure process of exposing an imprint material on the first pattern forming region and making an amount of exposure for the imprint material on a partial region of the first pattern forming region smaller; a second pattern forming process of bringing the mold into contact with an imprint material on a second pattern forming region after the first pattern forming process to form a pattern; and a second exposure process of exposing the imprint material on the second pattern forming region and the imprint material on the partial region of the first pattern forming region.

Imprint method and method for manufacturing article

An image forming apparatus includes a detection unit configured to obtain information with regard to the life of a secondary transfer member based on the variation in an electric resistance value of a secondary transfer portion, wherein the detection unit performs a process of reducing the effect of variation in the electric resistance value of an intermediate transfer member contained in the variation in the electric resistance value of the secondary transfer portion, based on a detection result of information with regard to the electric resistance value of the secondary transfer portion by a second detection unit, and on a detection result of information with regard to an electric resistance value of a primary transfer portion by a first detection unit, and obtains the information with regard to the life of the secondary transfer member.

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Tokyo, Japan

Ryosuke Hamamoto