Fujikin Inc.

Other

Tokyo Electron Limited

Tadahiro Ohmi

Ryosuke Dohi

Nobukazu Ikeda

Hiroyuki Fukuda

Koji Nishino

Kouji Nishino

Michio Yamaji

Eiji Ideta

Naofumi Yasumoto

Akihiro Morimoto

Yukio Minami

Koji Kawada

Tsutomu Shinohara

Migaku Takahashi

Tsuyoshi Tanikawa

Tomio Uno

Hiroshi Morokoshi

Kunio Nagai

Yasuyuki Yanai

Kaoru Hirata

Kazuhiko Sugiyama

Yohei Sawada

Toyomi Uenoyama

Stable flow control is made possible even under high-temperature environments by relieving tensional force applied to a piezoelectric element when a piezoelectric actuator is retracted. Thus, a piezoelectric driven control valve includes: a body having a valve seat; a metal diaphragm to contact with and separate from the valve seat; an actuator box supported ascendably and descendably on the body; a split base fixed to the body; a disc spring pressing and urging the actuator box downward to bring the metal diaphragm into contact with the valve seat; and a piezoelectric actuator housed inside the actuator box and that extends upward with application of voltage to press the actuator box upward against the elastic force of the disc spring, and a precompression mechanism, for applying a compression force constantly to piezoelectric elements in the piezoelectric actuator, provided between the split base and the piezoelectric actuator.

Piezoelectric driven control valve

A method for supplying a specified quantity Q of processing gas while dividing at a desired flow rate ratio Q/Qaccurately and quickly from a gas supply facility equipped with a flow controller into a chamber. When a specified quantity Q of gas is supplied while being divided at a desired flow rate ratio Q/Qfrom a gas supply facility equipped with a flow controller into a reduced pressure chamber C through a plurality of branch supply lines and shower plates fixed to the ends thereof, pressure type division quantity controllers FVand FVare provided in the plurality of branch supply lines GLand GL. Opening control of both division quantity controllers FVand FVis started by an initial flow rate set signal from a division quantity control board FRC for fully opening the control valve CV of the pressure type division quantity controller having a higher flow rate and pressures P' and P&#x2033; on the downstream side of the control valve CV are regulated thus supplying a total quantity Q=Q+Qof gas while dividing into the chamber C through orifice holes () made in shower plates () at desired division quantities Qand Qrepresented by formulas Q=CP&#x2032; and Q=CP&#x2033; (where, Cand Care constants dependent on the cross-sectional area of the orifice hole or the gas temperature on the upstream side thereof).

Method of supplying divided gas to a chamber from a gas supply apparatus equipped with a flow-rate control system

A fluid control valve, which can control a fluid having a pressure in the order of 10 kg/cm , has a response time in the order of several milliseconds can be made small in size, and a fluid supply/exhaust system that provides less gas counter flow in the event of a plurality of valves being used. A fluid control valve of the invention controls a fluid moving in a valve body by closing and opening a portion between a valve seat and a valve holder by use of a drive unit. The drive unit has a rod-shaped shaft for application of pressure through the valve seat and the valve holder, and a member &ldquo;a&rdquo; fixed around the rod-shaped shaft. The member &ldquo;a&rdquo; is made from a magnetic material, and has a space between it and the shaft. A coil provided in parallel to the shaft, moves the shaft via the member &ldquo;a&rdquo; up and down by electromagnetic induction, and makes use of a spring force to close and open a portion between the valve seat and the valve holder.

Fluid control valve and fluid supply/exhaust system

A fluid control valve, which can control a fluid having a pressure in the order of 10 kg/cm,, has a response time in the order of several milliseconds can be made small in size, and a fluid supply/exhaust system that provides less gas counter flow in the event of a plurality of valves being used. A fluid control valve of the invention controls a fluid moving in a valve body by closing and opening a portion between a valve seat and a valve holder by use of a drive unit. The drive unit has a rod-shaped shaft for application of pressure through the valve seat and the valve holder, and a member &ldquo;a&rdquo; fixed around the rod-shaped shaft. The member &ldquo;a&rdquo; is made from a magnetic material, and has a space between it and the shaft. A coil provided in parallel to the shaft, moves the shaft via the member &ldquo;a&rdquo; up and down by electromagnetic induction, and makes use of a spring force to close and open a portion between the valve seat and the valve holder.

A good quality passive-state film is formed on a gas-contact face of a diaphragm of a pressure detector using a sensor chip to prevent corrosion on, or water content emission from, or catalytic action at a gas-contact face, thereby improving production quality in a semiconductor manufacturing process and providing high accuracy pressure detection. The passive-state film is formed on the gas-contact face of the diaphragm when the diaphragm is mounted on a diaphragm base. The diaphragm base is then fixedly secured to a sensor base in which a sensor chip is housed and a pressure transmitting medium is sealed in a gap between the sensor base and the diaphragm base.

Fluid pressure detector using a diaphragm

A system of the invention for supervising piping work comprises a machine for performing piping work such as welding of pipes or tightening of pipe joints under predetermined conditions, check means for checking whether the piping work has been executed properly based on predetermined values of piping work conditions and actual piping work data, a host computer for accumulating the predetermined values of piping work conditions, the actual piping work data and the result of checking, and communication means for transmitting the predetermined values of piping work conditions, the actual piping work data and the result of checking.

System for supervising piping work

A pressure type flow rate control apparatus (1) controls flow rate of a fluid in an environment where a ratio of P2/P1 between an absolute pressure P1 at an upstream side of an orifice and an absolute pressure P2 at a downstream side of the orifice is maintained at a value less than about 0.7. The apparatus comprises: a plate for forming the orifice (5); a control valve (2) positioned upstream of the orifice; an orifice corresponding valve (9) positioned downstream of the orifice (5); a primary pressure detector (3) positioned between the control valve (2) and the orifice (5); a secondary pressure detector (11) positioned downstream of the orifice (5); a calculation control device (6) for calculating flow rate Qc on the basis of the measured pressure P1 of the primary pressure detector (3) by a formula Qc=KP1 (K being a constant) and for outputting as a control signal Qy a difference between a flow rate command signal Qs and the calculated flow rate signal Qc to a drive unit (14) of the control valve 2; and a pressure comparing, calculating apparatus (10) for calculating the ratio of P2/P1 between the detected pressure P1 of the primary pressure detector (3) and the detected pressure P2 of the secondary pressure detector (11). The pressure P1 upstream of the orifice is adjusted by opening and closing the control valve by the control signal Qy, thereby controlling the flow rate downstream of the orifice.

Pressure type flow rate control apparatus

A pressure type flow rate control apparatus (1) for controlling flow rate of a fluid maintains an upstream side pressure P1 of an orifice at more than about twice a downstream side pressure P2. In addition to an orifice-forming member (5) the apparatus includes a control valve (2) provided at the upstream side of the orifice, a pressure detector (3) provided between the control valve and the orifice, and an operation control device (6) for calculating a flow rate Qc from the detected pressure P1 of the pressure detector as Qc=KP1 (K being a constant) and issuing a difference as a control signal Qy between a flow rate command signal Qs and the calculated flow rate Qc to a drive unit of the control valve. The orifice upstream side pressure P1 is adjusted by opening and closing the control valve, thereby controlling the orifice downstream side flow rate.

A tightening device comprises an upper plate, a lower plate disposed below the upper plate in parallel thereto, a nut rotating gear supported by the lower plate so as to be rotatable in a horizontal plane, and a spur gear provided on an underside of the upper plate and meshable with the nut rotating gear for rotating the nut rotating gear. The upper plate has a portion fittable to a flange of an externally threaded member for preventing the rotation of the threaded member, while the nut rotating gear has a portion fittable to a nut. With the nut manually tightened on the threaded member in advance, the flange fitting portion of the upper plate is fitted to the flange, the nut is fitted in the fitting portion of the nut rotating gear, and the spur gear is thereafter rotated, whereby the nut rotating gear is driven to tighten up the nut on the threaded member.

Tightening device

A reference range of tightening torques is predetermined relative to the rotation angle of a threaded member as normally tightened. In tightening up a nut on an externally threaded member, the tightening torque is detected by a torque sensor every time the nut is rotated through a specified angle, and whether the tightening torque relative to the rotation angle is within the reference range is judged by a microcomputer. The result of judgment is indicated by a light-emitting diode and a buzzer.

Growing community of inventors

Osaka, Japan

Ryosuke Dohi