Denso Corporation

Ryonosuke Tera

Takahiko Yoshida

Yasuyuki Okuda

Makiko Sugiura

Yuta Hasebe

Kahoru Mori

Koji Ino

Taizo Ishida

Yasutoshi Suzuki

Inao Toyoda

Yasutoshi Yamanaka

Hiroshi Tanaka

Masaaki Ozaki

Isao Kuroyanagi

Akio Sugiura

Naoyuki Kawazoe

Toshiki Itoh

Kazuaki Kafuku

Takeshi Yamauchi

Harumi Suzuki

Kazuhide Sato

Atsushi Yamamoto

Shoichi Kawai

Yukihiro Sano

Yasuaki Hirokawa

Shigeru Miyaji

Daisuke Itomura

Hayato Nagaya

A method for manufacturing a heat exchanger includes: assembling a plurality of heat exchanger components in an assembly step; and forming a film on surfaces of the heat exchanger components using a chemical vapor deposition method in a film formation step after the assembly step. The film can restrict a formation of a through hole due to corrosion. The film can be restricted from being damaged at a delivery or assembling time, because the film formation step is provided after the assembly step. An occurrence of clogging can be restricted at a minute portion inside of the heat exchanger in the film formation step, because the film is formed using the chemical vapor deposition method.

Method for manufacturing heat exchanger, and heat exchanger

A plasma generating apparatus includes: a power supply one of whose electrodes is connected to vacuum chamber walls of N vacuum chambers; an oscillator which outputs a pulse signal at every predetermined period; N pulse amplifying circuits which are connected in parallel to the oscillator as well as to the other electrode of the power supply, and each of which amplifies the pulse signal and supplies the amplified pulse signal to a corresponding one of N electrodes disposed in the N vacuum chambers; and at least (N-1) timing generating circuits which are connected between the oscillator and at least (N-1) pulse amplifying circuits, and which delay the pulse signal by respectively different delay times so that at any specific time, the pulse signal is supplied to only one of the pulse amplifying circuits.

Plasma generating apparatus

A color organic EL display includes: a substrate; a color filter layer disposed on the substrate; a gas barrier layer disposed on the color filter layer; and an organic EL structural body disposed on the gas barrier layer. The substrate and the color filter layer provide an underlayer of the gas barrier layer. The underlayer is a degassed underlayer. The gas barrier layer is provided by an atomic layer deposition method at a temperature equal to or lower than a decomposition starting temperature of the color filter layer.

Method for manufacturing color organic EL display

An organic EL display includes an organic material, a gas barrier layer on the member, and an organic EL unit on the gas barrier layer. The gas barrier layer comprises AlxTiyOz, wherein Al represents aluminum, Ti represents titanium, O represents oxygen, x represents the ratio of atoms of Al, y represents the ratio of atoms of Ti, and z represents the ratio of atoms of O. A Ti-atom ratio of the gas barrier layer is given in the units of atom % and defined by the following equation: Ti-atom ratio={y/(x+y)}&#xb7;100. The gas barrier layer has a first portion at an interface with the member and a second portion at an interface with the organic EL unit. The Ti-atom ratio of the first portion is 0 atom %. The Ti-atom ratio of the second portion is greater than or equal to 10 atom %.

Organic electroluminescent display and method of making the same

The TMR device has a structure including a lower electrode layer, a pinned layer, a tunnel barrier layer, a free layer, and an upper electrode layer which are successively formed on a substrate. The tunnel barrier layer has substantially a stoichiometric composition. The tunnel barrier layer may be a thin film of an oxide of AL formed by ALD method.

Tunnel magnetoresistance device with tunnel barrier layer containing residual carbon

An ultrasonic sensor for detecting an object includes a sending element for sending an ultrasonic wave to the object, a receiving portion for receiving the wave reflected by the object, a first transmitting portion for transmitting a vibration of the wave received by the receiving portion, a second transmitting portion and an oscillating portion which is oscillated by the vibration. The receiving portion is exposed to a space where the object exists. The second transmitting portion is coupled between the first transmitting portion and the oscillating portion so as to transmit the vibration from the first transmitting portion to the oscillating portion.

Ultrasonic sensor

An ultrasonic sensor includes a sending element for sending an ultrasonic wave to an object to be detected, a receiving portion for receiving the ultrasonic wave reflected by the object, an oscillating portion that oscillates by the ultrasonic wave transmitted thereto, and a supporting portion for holding an end part of the oscillating portion. The receiving portion is exposed to a space where the object exists. The receiving portion and the oscillating portion are connected through the supporting portion such that the ultrasonic wave received by the receiving portion is transmitted to the oscillating portion through the supporting portion. The oscillating portion is separate from the receiving portion by the supporting portion.

An ultrasonic wave generating device includes a substrate, a heat insulation layer on the substrate, a membrane heating portion on the heat insulation layer, and a membrane oscillator on the heating portion. The heating portion is electrically driven with a predetermined period, and produces heat for thermally displacing a surface of the oscillator. The oscillator receives a temperature variation with the predetermined period from the heating portion, and oscillates so as to generate ultrasonic waves.

Ultrasonic wave generating device

An organic EL device has a structure in which an anode, a hole transporting layer, an organic luminescent layer, and a cathode are disposed on a glass substrate in this order. The organic EL device further has a protective layer covering an outer surface of the structure to protect it from an external environment. The protective layer is formed by an ALE method at a temperature lower than glass transition temperatures materials constituting the hole transporting layer and the organic luminescent layer.

Method for manufacturing organic EL device with protective layer

A piezoelectric element and an injector using the same piezoelectric element are disclosed, which are so high in reliability as not to be shorted even in a high humidity environment, are small in size, are low in cost and are high in heat radiation capability. The piezoelectric element comprises a ceramic laminate () including a plurality of ceramic layers of a piezoelectric ceramic () and a plurality of internal electrode layers (), stacked alternately. At least an organic insulating layer () of an organic material is formed on at least a part of the surface of the ceramic laminate (), and at least an inorganic insulating layer () of an inorganic material is formed on the organic insulating layer ().

Growing community of inventors

Toyota, Japan

Ryonosuke Tera