Tokyo Electron Limited

Ryoji Yamazaki

Shigeru Kasai

Sumi Tanaka

Hiroyuki Miyashita

Mikio Sato

Mitsutoshi Ashida

Yuji Obata

A plasma observation system includes a plasma processing apparatus which includes a processing container in which a substrate is processed with plasma, and a plurality of observation windows each capable of observing an emission state of the plasma in the processing container; and a measuring device including a light receiver configured to receive a plurality of light beams intersecting in the processing container through a plurality of observation windows, and a controller configured to specify an observation point of the plasma and determine a state of the plasma at the observation point based on the plurality of light beams received by the light receiver.

Plasma observation system and plasma observation method

There is provided a microwave irradiation apparatus capable of independently controlling a temperature of a target object while irradiating microwave to the target object. The microwave irradiation apparatusincludes a processing chamberconfigured to be vacuum-evacuated; a supporting tableconfigured to support the target object; a processing gas introduction unitconfigured to introduce a processing gas into the processing chamber; a microwave introduction unitconfigured to introduce the microwave into the processing chamber; a heating unitconfigured to heat the target object; a gas cooling unitconfigured to cool the target object by a cooling gas; a radiation thermometerconfigured to measure a temperature of the target object; and a temperature control unitconfigured to adjust the temperature of the target object by controlling the heating unit and the gas cooling unit based on the temperature measured by the radiation thermometer.

Microwave irradiation apparatus

Growing community of inventors

Nirasaki, Japan

Ryoji Yamazaki