Canon Kabushiki Kaisha

Ryoji Kondo

Masakazu Tohara

Norifumi Kajimoto

Kyota Nozu

The optical system introduces light from a display element displaying an image to an observer. The optical system includes in order from the display element toward the observer, a first phase plate, a semi-transmissive reflective surface, a lens, a second phase plate, and a polarization beam splitter configured to reflect a first linearly polarized light and transmit a second linearly polarized light whose polarization direction is orthogonal to that of the first linearly polarized light. The semi-transmissive reflective surface has a transmittance smaller than a reflectance thereof.

Optical system and image display apparatus provided therewith

An image display apparatus includes an image display element, and an eyepiece optical system configured to guide light from the image display element to an exit pupil. The eyepiece optical system includes at least one correction element having different characteristics between a central area and a peripheral area different from the central area. When first light is light emitted from a central portion of the image display element, and second light is light emitted from an outermost peripheral portion of the image display element, the characteristics of the at least one correction element are set such that color drift of the second light after pass through the peripheral area from the first light after pass through the central area is less than color drift of the second light before pass through the peripheral area from the first light before pass through the central area.

Image display apparatus

provided is an image display device that can reduce deterioration in image quality in a peripheral portion of an eyepiece optical system, includes an eyepiece optical system having a polarization element and guiding light from an image display element toward eyeballs of an observer, in which the eyepiece optical system includes a first lens for determining an emission angle from the image display element, and a surface of the first lens on the image display element side has an aspherical shape having a convex shape in a region including an optical axis of the first lens, wherein the aspherical shape has an inflection point within an optically effective region in a cross section including the optical axis, and wherein an eye relief E of the eyepiece optical system satisfies 15 mm&#x2264;E&#x2264;25 mm.

Image display device and eyepiece optical system

An image display apparatus includes an observation optical system that includes a prism having first to third surfaces. The observation optical system has a first section is a section that contains an optical path of light from a center of the original image to a center of the exit pupil through the third surface, the first surface, the second surface, and the first surface, and a second section is a section orthogonal to the first section. A reflection area for an internal reflection of the light on the first surface has a center part that is concave toward the exit pupil on the second section and a peripheral part at both sides of the center part has a convex shape toward the exit pupil.

The image display apparatus includes an optical system causing a light flux entering from an original image through an entrance surface to reflect at a part of reflective surfaces, causing the reflected light flux to form an intermediate image, and then causing the light flux to reflect at another part of the reflective surfaces and exit from an exit surface toward an exit pupil located in a first direction. The optical element includes a first optical portion, a second optical portion provided in a second direction orthogonal to the first direction with respect to the first optical portion, and a connection portion to be connected to a holding portion provided in the apparatus. The connection portion is formed on a side face of the first optical portion so as to be included within a maximum width of the second optical portion.

The image display apparatus includes an optical system causing a light flux entering from an original image by being transmitted through a fifth surface to reflect at a fourth surface, a third surface, a first surface and a second surface and then cause the light flux to be transmitted through the first surface and exit toward an exit pupil, causing the light flux to form an intermediate image and causing optical paths to intersect with each other. The optical system satisfies 0.62&#x2266;Lf&#x2266;5.00 and 1.80&#x2266;LL&#x2266;5.00. When a distance between hit points of a central-view-angle principal ray on the surfaces is referred to as a hit point distance, Lrepresents a hit point distance between the fourth and fifth surfaces, Lrepresents a hit point distance between the first and second surfaces, and f represents a focal length of the optical system.

Image display apparatus and image capturing apparatus

A method of forming a pattern with dots or holes arranged in a two-dimensional period by illuminating, with illumination light, a mask having a light-shielding portion pattern on a translucent substrate, and performing projection and exposure of an object to be exposed through a projection optical system. The illumination light is an effective light source of multipole illumination. A first exposure process is performed with the mask placed at a first position relative to the object to be exposed, and a second exposure process is performed with the mask placed at a second position. The mask has line patterns having lines with a line width[m] arranged in parallel at a pitch of P. The line patterns are arranged in a mesh such that the line patterns intersect one another at 60&#xb0; in three directions, and the illumination light is an effective light source of hexapole illumination. The second exposure process is performed, after the first exposure process, with the mask placed at a second position displaced from the first position by 2P/3 [m] in a direction perpendicular to any line of the line patterns. A third exposure process is performed, after the second exposure process, with the mask placed at a third position further displaced from the second position by 2P/3 [m] in the direction, to thereby form a dot pattern in a two-dimensional period having a pitch of P/3 [m].

Pattern forming method

In an exposing method which illuminates, by illumination light, a mask having apertures arranged in matrix and a latticed light shielding portion, projects the mask on an object to be projected via a projection optical system, and thus forms a dark portion pattern image at a position conjugate in relation to intersections of a lattice of the light shielding portion, an available light source shape of the illumination satisfies a specific condition. Therefore, it is possible to exposure a two-dimensional periodic pattern to a theoretical limit pitch being the same as that of a one-dimensional periodic pattern, and it is also possible to secure a depth of focus sufficiently.

Growing community of inventors

Yokohama, Japan

Ryoji Kondo