Kabushiki Kaisha Toshiba

Nittetu Chemical Engineering Ltd.

Ryoichi Maekawa

Teruhiko Hirabayashi

Eiichi Akiyoshi

Yoshiyuki Imagire

Toshiaki Kurihara

A method of regenerating an etching waste fluid, includes the steps of dissolving HCl gas in an etching waste fluid at a temperature falling within a range of 20.degree. C. to 50.degree. C. and crystallizing NiCl.sub.2 and FeCl.sub.2 crystals, the etching waste fluid containing NiCl.sub.2, FeCl.sub.3, and FeCl.sub.2 and being obtained by etching Ni or an Ni alloy with an etching solution consisting of an aqueous solution containing FeCl.sub.3, distilling a mother liquor at the atmospheric pressure after crystallization and separation thereof to reduce the HCl concentration in the mother liquor, and distilling, at a reduced pressure, a concentrate obtained upon distillation at the atmospheric pressure to further reduce the HCl concentration, thereby obtaining an aqueous solution containing FeCl.sub.3, or bringing the concentrate obtained by distillation at the atmospheric pressure into contact with an iron oxide to cause HCl in the concentrate to react with the iron oxide to further reduce the HCl concentration in the concentrate thereby obtaining the aqueous solution containing FeCl.sub.3 with little HCl.

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Tokyo, Japan

Ryoichi Maekawa