Nuflare Technology, Inc.

Ryoichi Kakehi

Osamu Iizuka

Kiyoshi Hattori

Takahito Nakayama

Michihiro Sakai

A charged particle beam adjustment method includes scanning, with a charged particle beam an emission current of which is set to a first adjustment value smaller than a target value, an aperture substrate including a hole disposed to be a focus position of the charged particle beam using each of lens values in an electron lens and calculating first resolution, calculating a first function of lens values and the first resolution and calculating a lens value range, scanning, with the charged particle beam the emission current of which is set to a second adjustment value, the aperture substrate using each of lens values set to avoid the lens value range and calculating second resolution, calculating a second function of lens values and the second resolution and estimating a lens value at a just focus, and adjusting the electron lens to the lens value at the just focus.

Charged particle beam adjustment method, charged particle beam drawing method, and charged particle beam irradiation apparatus

In one embodiment, a multi charged particle beam writing apparatus includes a stage position detector detecting a position of the stage which holds a substrate to be written, a mark disposed on the stage, a beam position detector detecting a beam position of each beam by allowing the multiple beams to pass over the mark, a beam shape detector detecting a beam shape of the multiple beams at predetermined time intervals based on the detected beam position and the detected position of the stage, the multiple beams being used to irradiate the substrate, and a writing data processor calculating an amount of irradiation correction of each beam for correcting the beam shape based on the detected beam shape.

Multi charged particle beam writing apparatus and multi charged particle beam writing method

A charged particle beam writing apparatus includes a stage on which a target object is placed; an emitting unit configured to emit a charged particle beam to the stage side; a blocking unit arranged between the emitting unit and the stage and configured to block the charged particle beam emitted; a deflector having electrodes through which a current flows by applying a voltage and configured to deflect the charged particle beam passing between the electrodes onto the blocking unit by applying a predetermined voltage across the electrodes; an optical axis adjusting unit configured to correct optical axis deviation of the charged particle beam generated by continuously repeating irradiation (beam-ON) of the charged particle beam on a target object and blocking (beam-OFF) of the beam by applying a two-step voltage to the deflector; and a control unit configured to control the optical axis adjusting unit such that an amount of the optical axis deviation is corrected.

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Yokohama, Japan

Ryoichi Kakehi