Daihen Corporation

Omron Tateisi Electronics Co.

Roran Co.

Ryohei Tanaka

Hiroshi Matoba

Shuji Omae

Toyokazu Kitano

Yutaka Kato

Hiroyuki Kotani

Hideo Ito

Shigeki Amadatsu

Yoshifumi Ibuki

Hirotaka Takei

Kosuke Maeda

Kenji Shigeki

Shozo Komaki

Minoru Okada

Shinsuke Hara

Takaaki Odake

Akinobu Kitamura

Toshimitsu Nakao

Norihiko Morinaga

A method is provided for evaluating the reliability of an electrical power measuring device for measuring high-frequency electrical power. To build an evaluation system, the measuring device, together with a reference electrical power measuring device, is arranged between a high-frequency power supply device and an artificial reproduction load, which includes an impedance conversion device and a reference load. Using this system, an uncertainty range of an electrical power measured value measured by the measuring device is calculated, according to a prescribed calculation formula, from the electrical power measured value, and a judgment is made as to whether or not the electrical power measured value measured by the measuring device is within the uncertainty range. If it is within the uncertainty range, the measuring device is evaluated as being reliable, while if it is not within the uncertainty range, the measuring device is evaluated as being unreliable.

Method for evaluating reliability of electrical power measuring device

A method for calibrating voltage and current detected by a high frequency measurement apparatus is provided. By the method, a basic calibration parameter for a wide impedance range but with low accuracy and quadrant-specific calibration parameters for highly accurate calibration are calculated. This calculation is performed based, on values obtained by measuring three reference loads and true values of the reference loads. A first calibration unit of the apparatus calibrates the detected voltage and current by using the basic calibration parameter. A quadrant determining unit of the apparatus determines in which quadrant an impedance calculated from the calibrated voltage and current lies. A second calibration unit of the apparatus further calibrates the voltage and current by using a quadrant-specific calibration parameter corresponding to the determination result input from the quadrant determining unit.

High frequency measurement apparatus and calibration method for high frequency measurement apparatus

A method for calibrating a high frequency measuring device so as to accurately measure plasma processing parameters within a chamber. A calibration parameter is calculated from a first set of three reference loads measured by a high frequency measurement device. A second calibration parameter is calculated from S parameters measured between a connection point where the high-frequency measuring device is connected and the inside of the chamber of a plasma processing device. A second set of three reference loads, which include the impedance previously calculated and encompass a range narrower than that encompassed by the first set of three reference loads, is measured with the reference loads in the chamber. Another calibration parameter is calculated from the measured impedances of the second set of three reference loads measured by the high- frequency measuring device, and the true values of those impedances, and a detected voltage signal and a detected current signal are calibrated using the above calibration parameters.

High-frequency measuring device and high-frequency measuring device  calibration method

A method is provided for calibrating voltage values and current values detected by a high-frequency measuring device. In a first step, a first parameter is calculated based on impedances calculated when the measuring device is connected to a first set of three reference loads and impedances of the first set of three reference loads. In a second step, plasma processing is carried out with the measuring device connected to a load to be measured, and detected voltage and current values are calibrated using the first parameter, and impedances as viewed from a connection point towards the load side are calculated based on the calibrated voltage and current values. In a third step, three impedances that encompass, when displayed on a Smith chart, a narrower range than a range encompassed by the impedances of the first set of three reference loads are determined, where the narrower range includes the impedances calculated in the second step. In a fourth step, a second parameter is calculated based on impedances calculated when the measuring device is connected to a second set of three reference loads respectively having the three impedances and also on impedances of the second set of three reference loads. In a fifth step, the measuring device is connected to the load to be measured, and detected voltage and current values are calibrated using the first parameter and the second parameter.

High-frequency measuring device and high-frequency measuring device calibration method

A high frequency device for supplying a high frequency power to a load, the high frequency device includes: an oscillating unit that can vary an oscillation frequency; a high frequency power supplying unit that serves as a power source by amplifying an oscillation signal output from the oscillating unit for supplying the high frequency power to the load; a reflected-wave information calculating unit that calculates reflected wave information on a reflected wave power, and outputs the reflected wave information; a frequency control unit that controls the oscillation frequency of the oscillating unit so as to lower the reflected wave information; an impedance adjusting unit that is disposed at a downstream of the high frequency power supplying unit in a power supplying direction, and that has at least one variable reactance element which can be controlled; and an element control unit that controls the variable reactance element of the impedance adjusting unit so as to lower the reflected wave information.

High frequency device with variable frequency and variable load impedance matching

An arc detector is provided for a plasma processing system including a HF power source, a plasma processor, and a voltage/current signal detector. The arc detector includes a calculator for the phase difference between the AC voltage signal and the AC current signal, a calculator for an effective voltage based on the AC voltage signal, a calculator for an effective current based on the AC current signal, an FFT processor for the frequency spectrum of the AC voltage or current signal, and an arc analyzer connected to the phase difference calculator, effective voltage calculator, effective current calculator, and FFT processor. The arc analyzer calculates the plasma processor's impedance based on the calculated phase difference, effective voltage, and effective current. The arc analyzer monitors arcs in the plasma processor, based on the fluctuation rate of the calculated impedance and the output level of a frequency component in the spectrum.

Arc detector for plasma processing system

A signal processing device includes a converting unit, a filtering unit, a differential computing unit, and a phase difference computing unit. The converting unit samples two alternating signals with a predetermined period and converts the sampled level values into digital alternating signal data. The filtering unit filters the two digital alternating signal data generated by the converting unit so as to abstract digital alternating signal data having a predetermined frequency, and the filtering unit comprises an adaptive digital filter. The differential computing unit computes differentials of the digital alternating signal data generated by the filtering unit. The phase difference computing unit computes phase difference using the two digital alternating signal data generated by the filtering unit, and the two digital alternating signal data generated by the differential computing unit.

Signal processing device for computing phase difference between alternating current signals

An adaptive digital filter includes a filtering circuit and a coefficient renewal circuit. The filtering circuit has a coefficient a defined by a fundamental formula: a[n+1]=a[n]+&#x3b2;&#xb7;e[n]&#xb7;q[n]/p[n]. &#x3b2; is a number greater than 0 and smaller than 2, e[n] is a difference between the input and the output of the filter, and q[n] and p[n] are formulas. The renewal circuit calculates a renewal value of the coefficient a. The coefficient renewal circuit calculates 2(m is an integer) greater than p[n] in the fundamental formula, and also calculates the renewal value of the coefficient a in accordance with an execution formula: a[n+1]=a[n]+&#x3b2;&#xb7;e[n]&#xb7;q[n]/2in place of the fundamental formula.

Adaptive digital filter

A high-frequency power device including: an oscillator; a high-frequency power supplier; a reflection coefficient calculator; a discharge signal output unit; and a frequency controller, wherein the frequency controller: instructs the oscillator to oscillate the oscillation signal at a first oscillation frequency for the period of time while a discharge signal is not in a state showing that the discharge has been commenced or in a state where the discharge is regarded as having been commenced; then instructs the oscillator to change the first oscillation frequency to a second oscillation frequency immediately after the discharge signal changes into the states; and then controls the oscillation frequency so that the absolute value is made small.

High-frequency power device and method for controlling high-frequency power

A high-frequency measurement unit includes a signal detector for detecting a high-frequency signal, and a calibration coefficient storage for storing calibration coefficients Cmin and Cmax used to calibrate a value Amin detected at the lowest limit frequency fmin and a value Amax detected at the uppermost limit frequency fmax to a proper measurement value Asmin and to a proper measurement value Asmax, respectively. The high-frequency measurement unit further includes a frequency detection unit for detecting a frequency fm of the high-frequency signal, a calibration coefficient calculation unit for calculating a calibration coefficient Cm for the frequency fm, and a calibration unit for calibrating the value Am detected by the signal detector to a proper measurement value Asm by using the calibration coefficient Cm calculated by the calibration coefficient calculation unit.

Plasma processing system

A high-frequency power source supplies high-frequency power to a load whose reflection characteristic for the power varies with time. The power source includes a frequency-variable power generator, a power detector for detecting the power into the load and the power from the load, a reflection coefficient calculator for calculating a reflection coefficient based on the detection of the power into and from the load, a frequency detector causing the power generator to generate high-frequency powers at various frequencies within a predetermined frequency range for obtaining the frequency that gives a minimum value to the calculated reflection coefficient, and a power supply controller for causing the power generator to generate a high-frequency power of the frequency obtained by the frequency detector and for supplying the high-frequency power to the load.

High-frequency power source

In a logic integrated circuit such as an FPGA, a controller reads in an instruction, and then directly transmits ON/OFF information for each of bits composing microcode included in the instruction, to registers and data memories that are allocated to each of the bits through control lines, to thereby control the registers and data memories. Thus, processing executed by the controller is simplified in this construction. This allows makings the controller having a simple structure, thereby making it possible to construct a simple CPU core on the logic integrated circuit such as the FPGA, decreasing a space of analytic logic, and eliminating necessity for re-integrating a hardware circuit every time the logic is renewed.

Logic integrated circuit, and recording medium readable by a computer, which stores a source of CPU core on said logic integrated circuit

There is disclosed a channel separating filter apparatus for separating a frequency-multiplexed signal comprised of channel signals into respective channel signals. A frequency-converting section frequency-converts the frequency-multiplexed signal into a plurality of channel signals, so that an average value of carrier wave frequencies of two channel signals which are located in the center of the frequency-multiplexed signal and are adjacent to each other becomes substantially zero, and then outputs the plurality of frequency-converted channel signals. Thereafter, a channel separating section separates the plurality of frequency-converted channel signals outputted from the frequency-converting section into respective channel signals each having only a frequency component of each channel signal, thereby separating the frequency-multiplexed signal into at least two channel signals.

Channel separating filter apparatus, PSK demodulator apparatus and PSK

An optical vehicle detection system comprising camera means for catching the image of a vehicle running in a selected roadway lane to generate an output video signal, inquiring means for inquiring if the output video signal includes a predetermined shadow signal component, and processing means associated with the inquiring means, if the output video signal includes the predetermined shadow signal component, for processing the output video signal as a signal having a component of shadow cast by a vehicle.

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Osaka, Japan

Ryohei Tanaka