Honda Motor Co., Ltd.

Waseda University

Ryogo Kato

Toshio Tokune

Toshiyuki Ohashi

Masahiro Ohta

Hidefumi Nikawa

Hiroshi Kawarada

Toshiyuki Shima

Provided is a substrate for carbon nanotube growth in which no metal particles as a catalyst aggregates and a method for manufacturing the substrate. A substrate for carbon nanotube growthincludes a base plate, a catalyst, a form-defining material layerwhich allows the catalystto be dispersed and arranged, and a covering layerwhich has a metal oxide to cover the catalyst. A method for manufacturing a substrate for carbon nanotube growthincludes a step of sputtering on a base platea metal which forms a catalystand oxidizing the surface of the metal, a step of sputtering a form-defining material on the base plate, and a step of further sputtering on the form-defining material a metal which forms a catalystand oxidizing the surface of the metal.

Substrate for carbon nanotube growth and method for manufacturing the same

Provided is a substrate for carbon nanotube growth in which no metal particles as a catalyst aggregates and a method for manufacturing the substrate. A substrate for carbon nanotube growthincludes a base plate, a noble metal alloy catalysthaving an alloy of a noble metal and a transition metal, and a form-defining material layerwhich allows the noble metal alloy catalystto be dispersed and arranged. A method for manufacturing a substrate for carbon nanotube growthincludes a step of sputtering a noble metal alloy on a base plate, a step of sputtering a form-defining material on the base plate, and a step of further sputtering the noble metal alloy on the form-defining material.

A carbon nanotube synthesizing apparatus in which the state of generated plasma can be stabilized is provided. A carbon nanotube synthesizing apparatuscomprises a chamber, an antennaincluding a tip, a microwave conductor, a gas introducing unit, a gas discharging unit, a substrate holding unit, and a heating unit. The shape of the inner wall of the chamberis symmetrical with respect to the tipof the antenna

Carbon nanotube synthesizing apparatus

Disclosed is a method capable of accelerating the growth of oriented carbon nanotubes when manufacturing the oriented carbon nanotubes by a plasma CVD. Under the circulation of a gas which is the raw material of the carbon nanotubes, plasma is generated by an antenna () provided in a depressurized treatment chamber (), and substrates () provided with a reaction prevention layer and a catalyst material layer which are formed on a base material are held at a distance, to which a radical can reach and an attack of an ion generated as a by-product of the radical can be avoided, from a plasma generation area (). The tip () of the antenna () can be controlled so as to match with the position of the anti-node of a stationary wave () of microwaves.

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Saitama, Japan

Ryogo Kato