Screen Holdings Co., Ltd.

Dainippon Screen Mfg. Co., Ltd.

Ryo Yamada

Itaru Furukawa

Tatsuya Masui

Kazutaka Taniguchi

Yoshiyuki Nakazawa

Kazuhiro Nakai

Shinji Shimizu

Kenji Nakanishi

Yoshio Furuya

Yuichi Deba

Kiyoshi Kitamura

Miwa Miyawaki

Satoru Yasaka

Ryosuke Ito

A substrate processing apparatus collectively processes a plurality of substrates with the plurality of substrates immersing in a processing liquid. The substrate processing apparatus includes a processing tank, a camera, and a controller. The processing tank stores the processing liquid. The camera is provided vertically higher above the processing tank and captures the inside of the processing tank to generate a plurality of items of captured image data. The controller generates smoothed image data obtained by smoothing a brightness distribution of waving caused on a liquid surface of the processing liquid based on integration of the plurality of items of captured image data, and monitors the inside of the processing tank based on the smoothed image data.

Substrate processing apparatus and monitoring method in substrate processing apparatus

An image display device for direct drawing apparatus for performing direct drawing comprising: an acquisition part for acquiring design data in a vector format describing the pattern; a specified parameter setting part for setting a specified parameter to be used for RIP development of the design data; a processing area setting part for setting a processing area of the design data to be subjected to RIP development; a display RIP development part for performing RIP development of a portion of the design data, which corresponds to the processing area, by using the specified parameter, to thereby obtain a specified image; and a display part for visibly displaying the specified image, wherein the RIP development performed by the display RIP development part is a display RIP development in which the amount of processed data is smaller than that in drawing RIP development for the direct drawing.

Image display device for direct drawing apparatus, and recording medium

A drawing device draws a pattern on a substrate by radiating light from an optical head part on a target object (for example, substrate) which relatively moves with respect to the optical head part. Here, the optical head part has a spatial modulating unit which spatially modulates light from a light source, based on pattern data, and an optical path corrector which shifts the route of light spatially modulated in the spatial modulating unit at precision subdivided more than units of spatial modulation in the spatial modulating unit (more specifically, for example, units of pixels of spatial light modulator).

Drawing device and drawing method

Correction values (&#x394;Xto &#x394;X) at the X position (X=xe) of a target point (E (xe, ye)) are calculated by calculating the amounts of shift (&#x394;X) in the positions of alignment marks (Mto M, Mto M, Mto M, Mto M) in the X direction and plotting first spline curves (SL) using the amounts of shift. Then, a first sub-spline curve (SLS) is plotted using the correction values (&#x394;Xto &#x394;X) in order to calculate a correction value (&#x394;Xe) at the Y position (Y=ye) of the target point (E (xe, ye)), and the calculated correction value is taken as the correction amount in the X direction. The correction amount in the Y direction is also calculated in the same manner.

Displacement calculation method, drawing data correction method, substrate manufacturing method, and drawing apparatus

Input CAD data and run-length data obtained by performing a RIP process on the input CAD data are acquired. A predetermined conversion process is performed on at least one of the input CAD data and the run-length data to make the data formats of both data comparable and then both data are compared with each other to detect an area having a difference as a defect area in the run-length data. This provides a technique to detect a defect in the run-length data to be used for drawing of a figure before the execution of drawing with a simple structure.

Defect inspection apparatus, defect inspection program, recording medium storing defect inspection program, figure drawing apparatus and figure drawing system

In a computer, fixed pattern information indicating respective shapes of fixed pattern elements included in a fixed pattern and respective position vectors of the fixed pattern elements with respect to a reference position in the fixed pattern is prepared and key pattern elements coincident with any of fixed pattern elements are specified from writing pattern elements. Subsequently, a value is added to a position designated by a reverse vector of position vector of a corresponding fixed pattern element with each of the key pattern elements as a starting point in a setting area which corresponds to a writing pattern, and a position is specified to which a value coincident with the number of fixed pattern elements is given, to detect an existing position of the fixed pattern in the writing pattern. It is thereby possible in the computer to extract a fixed pattern from a writing pattern at high speed.

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Kyoto, Japan

Ryo Yamada