Kabushiki Kaisha Toshiba

Toshiba Electronic Devices & Storage Corporation

Ryo Wada

Yuichi Goto

Hiroshi Saito

Tomoko Matsudai

Norio Yasuhara

Kaori Yoshioka

According to one embodiment, a hydrogen concentration of a bottom part in a vicinity of a boundary with the insulating layer in the first silicon layer is higher than a hydrogen concentration of a part above the bottom part in the first silicon layer. And a resistivity of the bottom part in the first silicon layer is lower than a resistivity of the part above the bottom part in the first silicon layer.

Semiconductor device and method for manufacturing same

In general, according to one embodiment, a semiconductor device includes a device main body, a semiconductor substrate. The device main body includes a semiconductor substrate mounting part and a first conductor provided around the semiconductor substrate mounting part. The semiconductor substrate includes a DC-to-DC converter control circuit having a detector to detect at least one of a current flowing through the first conductor and a voltage supplied to the first conductor. The semiconductor substrate is disposed on the semiconductor substrate mounting part so that the detector comes close to the first conductor.

Semiconductor device and DC-to-DC converter

According to one embodiment, in a dielectric isolation substrate, an insulating film having a first thickness is provided on a semiconductor substrate. A semiconductor layer of a first conductivity type having a second thickness is provided on the insulating film. An impurity diffusion layer of a second conductivity type is provided partially in a lower portion of the semiconductor layer and is in contact with the insulating film.

Growing community of inventors

Kanagawa-ken, Japan

Ryo Wada