Canon Kabushiki Kaisha

Ryo Takai

Zenichi Hamaya

Shinichiro Hirai

Masahiko Ogawa

Keiji Emoto

Kazunori Iwamoto

Hironori Maeda

Hiromichi Hara

Yoshihiro Morimoto

Takashi Miura

Masakatsu Yanagisawa

Takeshi Rokukawa

A detection apparatus including a plurality of detection systems arranged spaced apart from each other so as to detect, of a plurality of marks provided on an object held by a stage, marks different from each other, and a processing unit configured to perform a first process of obtaining a first detection value by detecting the plurality of marks by one or more detection systems in a first state in which the stage is arranged at a first rotation angle, and a second process of obtaining a second detection value by detecting the plurality of marks by two or more detection systems in a second state in which the stage is arranged at a second rotation angle, and obtain a difference between the first detection value and the second detection value for each of the plurality of marks.

Detection apparatus, detection method, exposure apparatus and article manufacturing method

The present invention provides a vibration damping apparatus that performs vibration damping of a first optical element among a plurality of optical elements arranged in a barrel, comprising: a holding member connected to the barrel and configured to hold the first optical element; and a mass body supported by the holding member via a damper element, wherein the mass body includes a second optical element different from the first optical element among the plurality of optical elements.

Vibration damping apparatus, lithography apparatus, and method of manufacturing article

The present invention provides an exposure apparatus exposing a substrate through a projection optical system, the apparatus comprising a stage configured to hold the substrate, a detection unit configured to emit detection light in a first direction and detect a position of the stage, a blowing unit configured to blow out a gas, and a guide unit including a first portion and a second portion, wherein the first portion is configured to guide the gas to a first space between the projection optical system and the substrate, such that a gas flow along the substrate is formed in the first space, and wherein the second portion is configured to guide the gas to a second space where the detection light passes through, such that a gas flow in a second direction is formed in the second space.

Exposure apparatus and method of manufacturing article

Provided is an interferometer system that irradiates an object to be measured with measuring light to thereby measure the position of the object to be measured. The interferometer system includes a laser light source; an interferometer configured to separate laser light emitted from an emission opening of the laser light source into the measuring light and reference light; and an optical path protecting member configured to surround an optical axis such that the laser light passes through the inside thereof and of which one opening is in contact with the emission opening.

Interferometer system, lithography apparatus, and article manufacturing method

A stage apparatus includes a stage, an interferometric measurement device which is arranged to be able to measure a position of a surface of a mirror arranged on a side surface of the stage, and a driving unit configured to position the stage based on a measurement result of the interferometric measurement device. The interferometric measurement device includes: a varying unit configured to periodically vary an incident position where measurement light is incident on the mirror; and a detecting unit configured to detect rotation of the mirror based on a variation amount of the measurement result of the interferometric measurement device, which is generated upon a periodic variation of the incident position.

Interferometric measurement of rotation of stage apparatus and adjustment method thereof, exposure apparatus and method of manufacturing device

To accurately measure the position and posture of a stage apparatus used in an exposure apparatus or the like, the Z position and displacement of a top stage ( ) are measured using as a reference a lens barrel support ( ) independently of the top stage in terms of vibrations by an interferometer system which includes a projection optical system ( ) for projecting a pattern formed on a master onto a substrate, stages ( ) capable of moving with respect to the projection optical system ( ) while holding the substrate or master, and a lens barrel support ( ) that supports the projection optical system ( ), and which uses a Z measuring mirror ( ) that is arranged on a Y stage ( ) and has a reflecting surface almost parallel to the XY plane, and a Z interferometer ( ) arranged on the Y stage ( ).

Growing community of inventors

Utsunomiya, Japan

Ryo Takai