Tokyo Electron Limited

Tokyo Electron Limi Ted

Ryo Shimada

Teruhiko Moriya

Seiji Nagahara

Makoto Hayakawa

Masaru Tomono

Kazuhiro Takeshita

Masatoshi Kaneda

Kazuki Nagamoto

A light irradiating device includes a substrate holder configured to hold a substrate; a light irradiating unit; and a power feed unit. The light irradiating unit comprises a light source configured to irradiate light to a surface of the substrate; and a first connector electrically connected with the light source. The power feed unit comprises a power supply module configured to supply a power to the light source; and a second connector electrically connected with the power supply module and configured to be connected to or disconnected from the first connector. The light irradiating unit and the power feed unit are coupled as one body as the first connector and the second connector are connected, and are separated from each other as the first connector and the second connector are disconnected from each other.

Light irradiating device

An optical processing apparatus includes: a housing; a stage; and a light irradiation unit configured to cause a light source unit to emit light so as to form a strip-like irradiation area extending over an area wider than a width of a substrate in a right and left direction. The stage and the light irradiation unit are moved by a moving mechanism relatively to each other in a back and forth direction. Light emitted from the light irradiation unit is deviated by a light-path changing unit from a relative movement area of a substrate. When a substrate is relatively moved below the light irradiation unit without the intension of being subjected to a light irradiation process, a control unit outputs a control signal such that an irradiation area is not formed on a surface of the substrate by the light-path changing unit, while the light source unit emitting light.

Optical processing apparatus and substrate processing apparatus

An exposure apparatus includes a stage on which a substrate is placed, a plurality of light irradiation units configured to emit light independently of each other to different positions in a right and left direction on a surface of the substrate, so as to form a strip-like irradiation area extending from one end of the surface of the substrate to the other end of the substrate, a stage moving mechanism configured to move the stage in a back and forth direction relative to the irradiation area, such that the whole surface of the substrate is exposed, and a light receiving unit configured move in the irradiation area between one end and the other end of the irradiation area in order to detect an illuminance distribution of the irradiation area in a longitudinal direction of the irradiation area.

Exposure apparatus, exposure apparatus adjustment method and storage medium

A substrate processing apparatus includes a housing, a mounting table provided in the housing and configured to mount a substrate thereon, a drive mechanism provided below the mounting table so as to move the mounting table in a front-back direction between a delivering/receiving location for the substrate and a processing chamber, an ultraviolet irradiation unit configured to irradiate the substrate in the processing chamber with ultraviolet rays, a partition member provided to partition the processing chamber and a drive chamber with the drive mechanism positioned therein up and down, the partition member having a slit for allowing movement of a support supporting the mounting table, first exhaust ports formed in the drive chamber to exhaust an atmosphere in the drive chamber, and second exhaust ports formed along a lengthwise direction of the slit so as to face the slit.

Growing community of inventors

Koshi, Japan

Ryo Shimada