Canon Kabushiki Kaisha

Ryo Nawata

Makoto Mizuno

Hiroshi Ito

Shigeyuki Uzawa

Yuichiro Miki

Mitsuru Inoue

Hiroyuki Sekiguchi

Katsumi Asada

Takashi Shibayama

Shota Takami

Kenji Noda

Yuma Onizawa

A control apparatus which controls a force applied to an object, includes a driver configured to apply the force to the object, an estimator configured to estimate, based on information related to a state of the object, an estimated value of a disturbance force to be applied to the object, a corrector configured to correct, based on the estimated value, a command value provided to the driver so as to reduce an influence of the disturbance force, and a determiner configured to execute processing for determining a plurality of parameter values to be used by the estimator to obtain the estimated value based on the information.

Control apparatus, imprint apparatus, and method of manufacturing article

A motion control apparatus includes a first movable part, a second movable part, a first measurement device for measuring a motion of the first movable part, a first compensator for generating a first manipulated variable based on an output from the first measurement device and a target value for controlling the motion of the first movable part, a generator for generating an observed value concerning a relative motion between the first movable part and the second movable part, a second compensator for generating a second manipulated variable based on the observed value, and a calculator for generating a manipulated variable for driving the first movable part based on an output from the first compensator and an output from the second compensator. For the second compensator, a parameter value for generating the second manipulated variable is decided by machine learning.

Motion control apparatus, lithography apparatus, planarization apparatus, processing apparatus, and article manufacturing method

The feedback control device takes information regarding a control deviation between a measured value and a target value of a controlled object as input, and outputs a control amount for the controlled object; comprising:

Feedback control device that suppresses disturbance vibration using machine learning, article manufacturing method, and feedback control method

An imprinting apparatus which is advantageous in improving the overlay accuracy in a shot located on an outer circumference of a substrate is provided. An imprinting apparatus which forms a pattern of an imprint material above a shot region of a substrate by performing alignment between each shot region of the substrate and a mold using a plurality of marks provided in each shot region of the substrate and a plurality of marks on the mold includes: a detection unit configured to detect at least a plurality of marks on the substrate in each shot region; and a control unit configured to use a first mark which is closest to a center of the substrate, a second mark which is arranged in a direction of a first axis along one side of the shot region with respect to the first mark, and a third mark which is arranged in a direction of a second axis perpendicular to the first axis with respect to the first mark for the alignment in each shot region, wherein the control unit uses, as the second mark, a mark which is arranged at a position closet to the center of the substrate in the shot region than that in a case in which the shot region is not located on the outer circumferential portion of the substrate when a shot region which is located on an outer circumferential portion of the substrate and whose center is located within the range of &#xb1;45&#xb0; from the first axis is subjected to the alignment, and the control unit uses, as the third mark, a mark which is arranged at a position closer to the center of the substrate in the shot region than that in a case in which the shot region is not located on the outer circumferential portion of the substrate when a shot region which is located on the outer circumferential portion of the substrate and whose center is located within the range of &#xb1;45&#xb0; from the second axis is subjected to the alignment.

Imprinting apparatus, imprinting method, method for producing article, substrate, and mold

An imprint method includes contact step of bringing imprint material on shot region of substrate and pattern region of mold into contact with each other, alignment step of aligning the shot region and the pattern region after the contact step, first irradiation step of, before the alignment step is completed, irradiating frame-shaped portion of the imprint material with light, second irradiation step, started after the first irradiation step is started, irradiating at least part of the imprint material on the shot region with light under condition different from condition in the first irradiation step so that alignment error between the shot region and the pattern region is reduced, third irradiation step of irradiating the entire imprint material on the shot region with light after the alignment step is completed.

Imprint method, imprint apparatus, and article manufacturing method

An imprint method includes bringing a mold and an uncured imprint material supplied onto a substrate into contact with each other, enhancing viscoelasticity of the imprint material, making position adjustment of the mold and the substrate, and curing the imprint material. The imprint material is supplied onto a shot region of the substrate, and time between bringing the mold brought into contact with the imprint material and starting enhancing viscoelasticity is shorter when the shot region includes an outer periphery of the substrate than when the shot region does not include the outer periphery of the substrate.

Imprint method and method for manufacturing article

The present invention provides a vibration control apparatus which controls vibration of an object supported via a support having a damping coefficient, the apparatus comprising a driving device configured to drive the object, and a controller configured to perform negative feedback control of the driving device based on information of vibration of the object, wherein the controller is configured to perform positive feedback control of the driving device based on information of a velocity of the object so as to reduce a force which the support causes to act on the object in accordance with the velocity.

Vibration control apparatus, lithography apparatus, and method of manufacturing article

The present invention provides a vibration reduction apparatus which reduces vibration of a first object supported on a base, the apparatus comprising a driving unit arranged between the base and the first object and configured to drive the first object, a reference system including a second object, and a control system including a detector configured to detect a relative distance between the first object and the second object, a compensator configured to control the driving unit such that the relative distance comes close to a target distance, and a high-pass filter configured to attenuate a signal in a predetermined frequency band in a path extending from the detector to the driving unit.

Vibration reduction apparatus, lithography apparatus and method of manufacturing article

The present invention provides a vibration reduction apparatus which reduces a vibration of a target object supported on a base, comprising a first object supported by a first elastic member on the base, a second object supported by a second elastic member on the first object, a detection unit including a sensor having a first electrode provided on the first object and a second electrode provided on the second object, and a processor configured to obtain a distance between the first electrode and the second electrode using the sensor, a first driving unit configured to drive the first object, a first control unit configured to control the distance between the first electrode and the second electrode constant based on a detection result, wherein the second electrode and the processor are electrically connected to each other via the second elastic member.

Vibration reduction apparatus, lithography apparatus, and method of manufacturing article

A vibration control apparatus is provided that controls the vibration of a first object supported by a base, the apparatus including: a first control system including a first compensator for outputting a first operation signal representing an input to a first driving unit based on a first detection signal output by a first detector; a second control system including a second compensator for outputting a second operation signal representing an input to a second driving unit based on a second detection signal output by a second detector; and a third control system including a third compensator for outputting a third operation signal representing an input to the first driving unit based on a signal relating to the second control system so as to compensate the vibration of the base.

Vibration control apparatus, lithography apparatus, and article manufacturing method

A vibration control apparatus includes a first spring mechanism to support a first object as part of a first system. To control vibration of the first object, a first actuator applies a force to the first object via a command value generated by a first computing based on an output of a detection system. The detection system includes a second spring mechanism to support a second object as part of a second system. A third spring mechanism supports a third object as part of a third system. The first displacement detector detects displacement of the third object relative to the second object. The third object is prevented from being displaced relative to the second object. A second natural frequency of the second system is higher than a first natural frequency of the first system, and a third natural frequency of a third system is higher than the first natural frequency.

An optical element is moved in six-degrees-of-freedom. Three first displacement sensors are disposed on a base plate and measure respective displacement amounts of three mutually different points on the optical element in a first direction. A second displacement sensor measures a displacement amount of one point on the optical element in a second direction. Two third displacement sensors measure respective displacement amounts of two mutually different points on the optical element in a third direction. A transformation processor transforms the six measured displacement amounts. A calibration processor calibrates the transformed displacement amounts with a calibration matrix of which coefficients are previously obtained to calibrate the displacement amounts in the six-degrees-of-freedom, which have errors due to measurement errors of the displacement sensors. A controller outputs command values based on differences between the calibrated displacement amounts and target displacement amounts.

Optical element positioning apparatus, projection optical system and exposure apparatus

An exposure apparatus includes a beam providing unit having a first component and second component to provide an exposure beam having pattern information to a substrate W, a measurement unit which measures a relative variation between the first component and the second component, a driving mechanism which drives at least one of the first component and second component, and a compensator which controls the driving mechanism on the basis of the measurement result obtained by the measurement unit so as to reduce the relative variation between the first component and the second component in at least the period during which the pattern is transferred onto the substrate.

Exposure apparatus and exposure method

An optical apparatus includes a first element, a second element, a support which supports the first element, a first measuring device which measures the position of the first element relative to the support, a second measuring device which measures the position of the second element relative to the support, a third measuring device which measures any deformation of the support, and a controller. The controller controls the relative position between the first element and the second element on the basis of the measurement results obtained by the first measuring device, the second measuring device, and the third measuring device.

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Utsunomiya, Japan

Ryo Nawata